Simulation of surface deformation for the lithographic object lens by Zernike polynomials
文献类型：会议论文
| 作者 | Zhu, Hongwei1; Xing, Tingwen1; Chen, Zexiang2 |
| 出版日期 | 2012 |
| 会议名称 | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment |
| 会议日期 | 2012 |
| 卷号 | 8417 |
| 页码 | 84172C |
| 通讯作者 | Zhu, H. |
| 中文摘要 | Surface deformation is the crucial factor for the imaging performance of the lithographic object lens in the manufacturing process. Simulation of surface deformation can predict the degradation of the wavefront error caused by surface deformation, find the lens which is most sensitive to the surface deformation even in the design phase. We develop a method to simulate the surface deformation by Zernike polynomials in this paper. In fact, the surface deformation generated in the manufacturing process is random. However, it does not mean that they have no rules at all. We analysize the Zernike coefficients distribution of the interferential data, and build a model to simulate the surface deformation. The model can generate random-surface-deformation according to the input RMS/PV bound in the form of INT file type, which can be added to the lens surface directly in the optical design program CODEV. The results show that the surface deformation generated by our model can simulate the interferential data very well. © 2012 SPIE. |
| 英文摘要 | Surface deformation is the crucial factor for the imaging performance of the lithographic object lens in the manufacturing process. Simulation of surface deformation can predict the degradation of the wavefront error caused by surface deformation, find the lens which is most sensitive to the surface deformation even in the design phase. We develop a method to simulate the surface deformation by Zernike polynomials in this paper. In fact, the surface deformation generated in the manufacturing process is random. However, it does not mean that they have no rules at all. We analysize the Zernike coefficients distribution of the interferential data, and build a model to simulate the surface deformation. The model can generate random-surface-deformation according to the input RMS/PV bound in the form of INT file type, which can be added to the lens surface directly in the optical design program CODEV. The results show that the surface deformation generated by our model can simulate the interferential data very well. © 2012 SPIE. |
| 收录类别 | EI |
| 语种 | 英语 |
| ISSN号 | 0277786X |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7469]  |
| 专题 | 光电技术研究所_应用光学研究室（二室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.University of Electronic Science and Technology of China, China |
| 推荐引用方式 GB/T 7714 | Zhu, Hongwei,Xing, Tingwen,Chen, Zexiang. Simulation of surface deformation for the lithographic object lens by Zernike polynomials[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment. 2012. |
入库方式： OAI收割
来源：光电技术研究所
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