Two-dimension lateral shearing interferometry for microscope objective wavefront metrology
文献类型：会议论文
| 作者 | Liu, Zhixiang1,2,3; Xing, Tingwen1; Jiang, Yadong2; Lv, Baobin1,2,3; Xu, Fuchao1 |
| 出版日期 | 2014 |
| 会议名称 | Proceedings of SPIE: Optical Design and Testing VI |
| 会议日期 | 2014 |
| 卷号 | 9272 |
| 页码 | 92721B |
| 通讯作者 | Liu, Zhixiang |
| 中文摘要 | Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE. |
| 英文摘要 | Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE. |
| 收录类别 | EI |
| 学科主题 | Aberrations - Interferometers - Interferometry - Microscopes - Optical design - Photonic crystals - Units of measurement - Wavefronts |
| 语种 | 英语 |
| ISSN号 | 0277786X |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7498]  |
| 专题 | 光电技术研究所_应用光学研究室（二室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China 2.University of Electronic Science and Technology of China, Chengdu, China 3.University of Chinese Academy of Sciences, Beijing, China |
| 推荐引用方式 GB/T 7714 | Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,et al. Two-dimension lateral shearing interferometry for microscope objective wavefront metrology[C]. 见:Proceedings of SPIE: Optical Design and Testing VI. 2014. |
入库方式： OAI收割
来源：光电技术研究所
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