Dynamic compensation for the lithographic object lens
文献类型：会议论文
| 作者 | Zhu, Hongwei1; Xing, Tingwen1; Chen, Zexiang2 |
| 出版日期 | 2014 |
| 会议名称 | Proceedings of SPIE: Optical System Alignment, Tolerancing, and Verification VIII |
| 会议日期 | 2014 |
| 卷号 | 9195 |
| 页码 | 91950P |
| 中文摘要 | The nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturing-induced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturing-induced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably. © 2014 SPIE. |
| 英文摘要 | The nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturing-induced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturing-induced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably. © 2014 SPIE. |
| 收录类别 | EI |
| 学科主题 | Alignment - Control equipment - Lithography - Manufacture - Optical systems - Wavefronts |
| 语种 | 英语 |
| ISSN号 | 0277786X |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7499]  |
| 专题 | 光电技术研究所_应用光学研究室（二室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China 2.University of Electronic Science and Technology of China, China |
| 推荐引用方式 GB/T 7714 | Zhu, Hongwei,Xing, Tingwen,Chen, Zexiang. Dynamic compensation for the lithographic object lens[C]. 见:Proceedings of SPIE: Optical System Alignment, Tolerancing, and Verification VIII. 2014. |
入库方式： OAI收割
来源：光电技术研究所
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