Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt
文献类型：期刊论文
| 作者 | Wang, XB; Huang, W; Gong, Y; Jiang, F; Zheng, HY; Zhu, TJ; Long, DW; Li, QN |
| 刊名 | ELECTROCHIMICA ACTA
 |
| 出版日期 | 2016 |
| 卷号 | 196期号:-页码:286—293 |
| 关键词 | KCL EUTECTIC MELTS MOLTEN LICL-KCL LIF-NAF-KF THORIUM FLUORIDE NUCLEAR-FUEL REDUCTION SALT ALLOYS THO2 IONS |
| ISSN号 | 0013-4686 |
| 通讯作者 | Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China. ; Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Key Lab Nucl Radiat & Nucl Energy Technol, Shanghai 201800, Peoples R China. ; Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Ctr Excellence TMSR Energy Syst, Shanghai 201800, Peoples R China. |
| 英文摘要 | The electrochemical behavior of Th(IV) ion on molybdenum (Mo) electrode was studied by cyclic voltammetry (CV) and square wave voltammetry (SWV) technologies at 773 K in ThF4-LiCl-KCl melt. The reduction of Th(IV) to metal Th at -1.67 V (vs. Ag/AgCl) is a four-electron exchange process, which is quasi-reversible and diffusion-controlled. The diffusion coefficient (D) and activation energy of diffusion process for Th(IV) were determined to be 3.77 x 10 (5) cm(2) s (1) and 59.2 kJ mol (1). The pulse potential electrolysis of ThF4-LiCl-KCl melt revealed that 86.8% of Th(IV) can be separated from the melt based on the inductively coupled plasma atomic emission spectrometer (ICP-AES) results. (C) 2016 Elsevier Ltd. All rights reserved. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000372877400032 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/25706]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Wang, XB,Huang, W,Gong, Y,et al. Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt[J]. ELECTROCHIMICA ACTA,2016,196(-):286—293. |
| APA | Wang, XB.,Huang, W.,Gong, Y.,Jiang, F.,Zheng, HY.,...&Li, QN.(2016).Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt.ELECTROCHIMICA ACTA,196(-),286—293. |
| MLA | Wang, XB,et al."Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt".ELECTROCHIMICA ACTA 196.-(2016):286—293. |
入库方式： OAI收割
来源：上海应用物理研究所
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