Study on laser direct writing system for 32nm node
文献类型：会议论文
| 作者 | Jiang Wenbo; Hu Song; Yang Yong; Zhao Lixin; Yan WEi; Zhou Shaolin; Chen Wangfu |
| 出版日期 | 2009 |
| 会议名称 | Proceedings of SPIE |
| 会议日期 | 2009 |
| 卷号 | 7284 |
| 通讯作者 | Jiang Wenbo |
| 中文摘要 | In this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system, there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the parameters of photon sieve, better resolution can be realized. |
| 英文摘要 | In this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system, there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the parameters of photon sieve, better resolution can be realized. |
| 收录类别 | EI |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7633]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 中国科学院光电技术研究所 |
| 推荐引用方式 GB/T 7714 | Jiang Wenbo,Hu Song,Yang Yong,et al. Study on laser direct writing system for 32nm node[C]. 见:Proceedings of SPIE. 2009. |
入库方式： OAI收割
来源：光电技术研究所
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