An optical modulation based focus method for optical projection lithography
文献类型：会议论文
| 作者 | Wangfu Chen; Song Hu |
| 出版日期 | 2010 |
| 会议名称 | Proceedings of the SPIE - The International Society for Optical Engineering |
| 会议日期 | 2010 |
| 卷号 | 7657 |
| 页码 | 76571J (6 pp.) |
| 通讯作者 | Wangfu Chen |
| 中文摘要 | An optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is obtained. Analytical result indicates that focusing resolution at nanometer level can be realized. |
| 英文摘要 | An optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is obtained. Analytical result indicates that focusing resolution at nanometer level can be realized. |
| 收录类别 | EI ; ISTP |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7636]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 中国科学院光电技术研究所 |
| 推荐引用方式 GB/T 7714 | Wangfu Chen,Song Hu. An optical modulation based focus method for optical projection lithography[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010. |
入库方式： OAI收割
来源：光电技术研究所
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