Focusing and leveling in dual stage lithographic system
文献类型：会议论文
| 作者 | Jinlong Li; Lixin Zhao; Song Hu; Shaolin Zhou |
| 出版日期 | 2010 |
| 会议名称 | Proceedings of the SPIE - The International Society for Optical Engineering |
| 会议日期 | 2010 |
| 卷号 | 7657 |
| 页码 | 76571H (7 pp.) |
| 通讯作者 | Jinlong Li |
| 中文摘要 | As a key technology in lithographic system, the wafer stage is a six-degree of freedom and long stroke movement platform whose movement and positioning accuracy are up to nano-scale, and it involves precision machinery, precision measurement, automation and materials science in one complex system. In the lithography process, the function of the stage includes: wafer transmission, alignment, focusing and leveling, scanning exposure and so on. Positioning accuracy of the stage directly affects the alignment accuracy, as well as focusing accuracy, thus affecting the improvement of lithographic resolution as a whole. For the rapid increasing in chip integration, the chip makers acquire higher throughput of the lithographic system, under the demand, there has been dual-stage technology, i.e., in one lithographic system, there are two wafer stages, which separately locates at measurement position and exposure location. They run independently and in parallel, when the measurement and the exposure are completed, the two stages exchange their positions and functions. The dual stage technology not only significantly increases the yield, but also improves the measurement accuracy in focus detection. Focusing and leveling in dual stage is different from that in single stage. In this paper, combination of grating-based focus detection and dual stage technology is used to introduce leveling and focusing in dual-stage system. The principle of focus detection, the way for height information transforming to the wafer leveling data, as well as the servo of focusing and leveling at exposure location are carried out in detail. |
| 英文摘要 | As a key technology in lithographic system, the wafer stage is a six-degree of freedom and long stroke movement platform whose movement and positioning accuracy are up to nano-scale, and it involves precision machinery, precision measurement, automation and materials science in one complex system. In the lithography process, the function of the stage includes: wafer transmission, alignment, focusing and leveling, scanning exposure and so on. Positioning accuracy of the stage directly affects the alignment accuracy, as well as focusing accuracy, thus affecting the improvement of lithographic resolution as a whole. For the rapid increasing in chip integration, the chip makers acquire higher throughput of the lithographic system, under the demand, there has been dual-stage technology, i.e., in one lithographic system, there are two wafer stages, which separately locates at measurement position and exposure location. They run independently and in parallel, when the measurement and the exposure are completed, the two stages exchange their positions and functions. The dual stage technology not only significantly increases the yield, but also improves the measurement accuracy in focus detection. Focusing and leveling in dual stage is different from that in single stage. In this paper, combination of grating-based focus detection and dual stage technology is used to introduce leveling and focusing in dual-stage system. The principle of focus detection, the way for height information transforming to the wafer leveling data, as well as the servo of focusing and leveling at exposure location are carried out in detail. |
| 收录类别 | EI ; ISTP |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7637]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 中国科学院光电技术研究所 |
| 推荐引用方式 GB/T 7714 | Jinlong Li,Lixin Zhao,Song Hu,et al. Focusing and leveling in dual stage lithographic system[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010. |
入库方式： OAI收割
来源：光电技术研究所
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