Technology of focus detection for 193nm projection lithographic tool
文献类型：会议论文
| 作者 | Di, Chengliang1,2; Yan, Wei1; Hu, Song1; Xu, Feng1,2; Li, Jinglong1,2 |
| 出版日期 | 2012 |
| 会议名称 | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems |
| 会议日期 | 2012 |
| 卷号 | 8418 |
| 页码 | 84180Y |
| 通讯作者 | Di, C. (dichengliang@163.com) |
| 中文摘要 | With the shortening printing wavelength and increasing numerical aperture of lithographic tool, the depth of focus(DOF) sees a rapidly drop down trend, reach a scale of several hundred nanometers while the repeatable accuracy of focusing and leveling must be one-tenth of DOF, approximately several dozen nanometers. For this feature, this article first introduces several focusing technology, Obtained the advantages and disadvantages of various methods by comparing. Then get the accuracy of dual-grating focusing method through theoretical calculation. And the dual-grating focusing method based on photoelastic modulation is divided into coarse focusing and precise focusing method to analyze, establishing image processing model of coarse focusing and photoelastic modulation model of accurate focusing. Finally, focusing algorithm is simulated with MATLAB. In conclusion dual-grating focusing method shows high precision, high efficiency and non-contact measurement of the focal plane, meeting the demands of focusing in 193nm projection lithography. © 2012 SPIE. |
| 英文摘要 | With the shortening printing wavelength and increasing numerical aperture of lithographic tool, the depth of focus(DOF) sees a rapidly drop down trend, reach a scale of several hundred nanometers while the repeatable accuracy of focusing and leveling must be one-tenth of DOF, approximately several dozen nanometers. For this feature, this article first introduces several focusing technology, Obtained the advantages and disadvantages of various methods by comparing. Then get the accuracy of dual-grating focusing method through theoretical calculation. And the dual-grating focusing method based on photoelastic modulation is divided into coarse focusing and precise focusing method to analyze, establishing image processing model of coarse focusing and photoelastic modulation model of accurate focusing. Finally, focusing algorithm is simulated with MATLAB. In conclusion dual-grating focusing method shows high precision, high efficiency and non-contact measurement of the focal plane, meeting the demands of focusing in 193nm projection lithography. © 2012 SPIE. |
| 收录类别 | EI |
| 语种 | 英语 |
| ISSN号 | 0277786X |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7643]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.Graduate University of Chinese Academy of Sciences, Beijing 100039, China |
| 推荐引用方式 GB/T 7714 | Di, Chengliang,Yan, Wei,Hu, Song,et al. Technology of focus detection for 193nm projection lithographic tool[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems. 2012. |
入库方式： OAI收割
来源：光电技术研究所
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