Maskless lithography alignment method based on phase-shifting Moiré fringes technique
文献类型：会议论文
| 作者 | Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1 |
| 出版日期 | 2012 |
| 会议名称 | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems |
| 会议日期 | 2012 |
| 卷号 | 8418 |
| 页码 | 84180L |
| 通讯作者 | Hu, S. (zsyioe@163.com) |
| 中文摘要 | The relative position of wafer and mask can be calculated by information of Moire´ fringe during alignment, a maskless lithography alignment method based on circular gratings Moire´ fringes phase-shifting technique is proposed in this paper. Circular grating Moire´ fringes have characteristics of measuring simultaneously angular displacement and line displacement. Location information of wafer in alignment can be real-time reflected in spatial phase of Moire´ fringes. A digital micromirror device controlled by a computer is used to generate phase-shifting grating labels, and phase-shifting Moire´ fringes will be formed by superposition of phase-shifting grating labels with grating label on the wafer. The position information of wafer can be abstained by phase analysis using Fourier transform method combined with phase-shifting technique, and gives feedback to the displacement stage to realize alignment. The theory basis of this method is emphatically introduced. Also, application of this method in maskless lithography alignment is analyzed in detail. Simulation results show that this method is high in accuracy, simple in operation and simple in algorithm. It provides a feasible method for lithography alignment technique. © 2012 SPIE. |
| 英文摘要 | The relative position of wafer and mask can be calculated by information of Moire´ fringe during alignment, a maskless lithography alignment method based on circular gratings Moire´ fringes phase-shifting technique is proposed in this paper. Circular grating Moire´ fringes have characteristics of measuring simultaneously angular displacement and line displacement. Location information of wafer in alignment can be real-time reflected in spatial phase of Moire´ fringes. A digital micromirror device controlled by a computer is used to generate phase-shifting grating labels, and phase-shifting Moire´ fringes will be formed by superposition of phase-shifting grating labels with grating label on the wafer. The position information of wafer can be abstained by phase analysis using Fourier transform method combined with phase-shifting technique, and gives feedback to the displacement stage to realize alignment. The theory basis of this method is emphatically introduced. Also, application of this method in maskless lithography alignment is analyzed in detail. Simulation results show that this method is high in accuracy, simple in operation and simple in algorithm. It provides a feasible method for lithography alignment technique. © 2012 SPIE. |
| 收录类别 | EI |
| 语种 | 英语 |
| ISSN号 | 0277786X |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7645]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan, 610209, China 2.University of Electronic Science and Technology of China, Chengdu, Sichuan, 610054, China 3.Graduate University of Chinese Academy of Sciences, Beijing 100039, China |
| 推荐引用方式 GB/T 7714 | Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Maskless lithography alignment method based on phase-shifting Moiré fringes technique[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems. 2012. |
入库方式： OAI收割
来源：光电技术研究所
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