Reflective plasmonic imaging lithography with deep sub-wavelength resolution and high aspect ratio
文献类型：会议论文
| 作者 | Wang, Changtao; Gao, Ping; Zhao, Zeyu; Yao, Na; Wang, Qinyan; Luo, Xiangang |
| 出版日期 | 2014 |
| 会议名称 | Optics InfoBase Conference Papers: CLEO: Science and Innovations, CLEO_SI 2014 |
| 会议日期 | 2014 |
| 通讯作者 | Luo, X. (lxg@ioe.ac.cn) |
| 中文摘要 | Reflective silver layer is employed toimproveboth resolution andfidelity of sub-diffraction lithography by amplifying evanescent waves and tailoring electric field components. Nano characters patterns with depth~35nm and about 36nm line width are obtained. © 2014 OSA. |
| 英文摘要 | Reflective silver layer is employed toimproveboth resolution andfidelity of sub-diffraction lithography by amplifying evanescent waves and tailoring electric field components. Nano characters patterns with depth~35nm and about 36nm line width are obtained. © 2014 OSA. |
| 收录类别 | EI |
| 学科主题 | Electric fields |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/7898]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | State Key Laboratory of Optical Technologies on Nano-Fabrication andMicro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China |
| 推荐引用方式 GB/T 7714 | Wang, Changtao,Gao, Ping,Zhao, Zeyu,et al. Reflective plasmonic imaging lithography with deep sub-wavelength resolution and high aspect ratio[C]. 见:Optics InfoBase Conference Papers: CLEO: Science and Innovations, CLEO_SI 2014. 2014. |
入库方式： OAI收割
来源：光电技术研究所
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