Nanoring formation by direct-write inorganic electron-beam lithography
文献类型：期刊论文
| 作者 | Jiang, N; Hembree, GG; Spence, JCH; Qiu, J; de Abajo, FJG; Silcox, J |
| 刊名 | appl. phys. lett.
 |
| 出版日期 | 2003 |
| 卷号 | 83期号:3页码:551 |
| 通讯作者 | jiang, n (reprint author), arizona state univ, dept phys & astron, tempe, az 85287 usa |
| 英文摘要 | a direct-write inorganic lithography technique is described which is capable of forming nanoscale rings of amorphous metals and semiconductors in glasses. near-edge electron energy loss spectroscopy and electron diffraction using a subnanometer probe are used to analyze the composition and formation mechanism of these nanorings. the optical absorption cross section of one ring is calculated by multiple scattering methods. applications in quantum electronics and the design of media with dielectric properties are suggested. (c) 2003 american institute of physics. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000184186700049 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/18286]  |
| 专题 | 上海光学精密机械研究所_高功率激光单元技术研发中心 |
| 作者单位 | 1.Arizona State Univ, Dept Phys & Astron, Tempe, AZ 85287 USA 2.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Photon Craft Project, Shanghai 201800, Peoples R China 3.Donostia Int Phys Ctr, San Sebastian, Spain 4.Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA |
| 推荐引用方式 GB/T 7714 | Jiang, N,Hembree, GG,Spence, JCH,et al. Nanoring formation by direct-write inorganic electron-beam lithography[J]. appl. phys. lett.,2003,83(3):551. |
| APA | Jiang, N,Hembree, GG,Spence, JCH,Qiu, J,de Abajo, FJG,&Silcox, J.(2003).Nanoring formation by direct-write inorganic electron-beam lithography.appl. phys. lett.,83(3),551. |
| MLA | Jiang, N,et al."Nanoring formation by direct-write inorganic electron-beam lithography".appl. phys. lett. 83.3(2003):551. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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