Spectral properties of erbium-doped oxyfluoride silicate glasses for broadband optical amplifiers
文献类型：期刊论文
| 作者 | Xu SQ(徐时清); Yang ZM(杨中民); Dai SX(戴世勋); Yang JH(杨建虎); Wen L(温磊); Hu LL(胡丽丽); Jiang ZH(姜中宏) |
| 刊名 | chin. phys. lett.
 |
| 出版日期 | 2003 |
| 卷号 | 20期号:6页码:905 |
| 通讯作者 | xu, sq (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china |
| 英文摘要 | the new oxyfluoride silicate glasses of er3+-doped 50sio(2)-(50-x)pbo-xpbf(2) were prepared. with increasing pbf2 content in the glass composition, the fluorescence full width at half maximum and lifetimes of the i-4(13/2) level of er3+ increase, while the refractive indices and densities decrease. er3+-doped 50sio(2)-50pbf(2) glass showed broad fluorescence spectra of 1.55 mum with a large stimulated emission cross-section and long lifetimes of i-4(13/2) level of er3+. compared with other glass hosts, the gain bandwidth properties of er3+-doped 50sio(2)-50pbf(2) glass are close to those of tellurite and bismuth glasses, and have advantages over those of silicate, phosphate and germante glasses. the broad and flat i-4(13/2) --> i-4(15/2) emission of er3+ around 1.55 mum can be used as host material for potential broadband optical amplifier in wavelength-division-multiplexing network system. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000183671800036 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/18464]  |
| 专题 | 上海光学精密机械研究所_高功率激光单元技术研发中心 |
| 作者单位 | Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu SQ,Yang ZM,Dai SX,et al. Spectral properties of erbium-doped oxyfluoride silicate glasses for broadband optical amplifiers[J]. chin. phys. lett.,2003,20(6):905. |
| APA | 徐时清.,杨中民.,戴世勋.,杨建虎.,温磊.,...&姜中宏.(2003).Spectral properties of erbium-doped oxyfluoride silicate glasses for broadband optical amplifiers.chin. phys. lett.,20(6),905. |
| MLA | 徐时清,et al."Spectral properties of erbium-doped oxyfluoride silicate glasses for broadband optical amplifiers".chin. phys. lett. 20.6(2003):905. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。