环形抛光技术在列阵透镜制造中的应用
文献类型：期刊论文
| 作者 | 焦翔; 朱健强; 樊全堂; 李养帅 |
| 刊名 | 中国激光
 |
| 出版日期 | 2015 |
| 卷号 | 42期号:7页码:708011 |
| 其他题名 | Application of Continuous Polishing Technology to Manufacturing of a Lens Array |
| 通讯作者 | Jiao Xiang, Key Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. ; Zhu Jianqiang, Key Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. ; Fan Quantang, Key Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. ; Li Yangshuai, Key Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. |
| 中文摘要 | 针对传统方法抛光高功率激光实验中使用的长焦距列阵透镜单元遇到的检测困难、一致性差等问题,提出了采用环形抛光的新方法。对环形抛光系统的理论分析表明,抛光盘面形可以稳定在球面状态。利用这种特性,环形抛光法可以抛光小曲率球面。阐述了抛光盘面形的调节方法。利用0.69 m环形抛光机对口径45 mm、曲率半径57207 mm的列阵透镜单元进行了抛光,结果表明面形精度和一致性均优于平面摆动式抛光法。最后对环形抛光机可抛光的球面曲率半径范围进行了探讨,发现盘面尺寸越小球面抛光能力越强,直径0.8 m的盘面可抛光的曲率半径可低至10 m。 |
| 英文摘要 | Aiming at the problems such as difficult to mearsure and bad consistency of the surfaces in polishing long- focus lens array elements by conventional method, the new way using continuous polishing machine is proposed. According to the theoretical research of the continuous polishing system, the surface of the polishing pad can keep spherical. The workpieces with small curvature spherical surfaces can be polished with the character. The adjusting methods of the polishing pad surface curvature are elaborated. According to the experiments of polishing lens array elements with aperture of 45 mm and curvature radius of 57207 mm in 0.69 m continuous polishing machine, the element surface accuracy and consistency are both better than using conventional oscillating polishing method. At last, the range of the curvature radius that can be polished in the continuous polishing machine is discussed and find that the smaller the polishing pad is, the stronger the ability of polishing spherical surface is. The radius of curvature which is polished in 0.8 m diameter can be as amall as 10 m. |
| 收录类别 | EI |
| 原文出处 | http://www.opticsjournal.net |
| 语种 | 中文 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/14007]  |
| 专题 | 上海光学精密机械研究所_高功率激光物理国家实验室 |
| 作者单位 | 1.焦翔, 中国科学院上海光学精密机械研究所, 中科院高功率激光物理重点实验室, 上海 201800, 中国. 2.朱健强, 中国科学院上海光学精密机械研究所, 中科院高功率激光物理重点实验室, 上海 201800, 中国. 3.樊全堂, 中国科学院上海光学精密机械研究所, 中科院高功率激光物理重点实验室, 上海 201800, 中国. 4.李养帅, 中国科学院上海光学精密机械研究所, 中科院高功率激光物理重点实验室, 上海 201800, 中国. |
| 推荐引用方式 GB/T 7714 | 焦翔,朱健强,樊全堂,等. 环形抛光技术在列阵透镜制造中的应用[J]. 中国激光,2015,42(7):708011. |
| APA | 焦翔,朱健强,樊全堂,&李养帅.(2015).环形抛光技术在列阵透镜制造中的应用.中国激光,42(7),708011. |
| MLA | 焦翔,et al."环形抛光技术在列阵透镜制造中的应用".中国激光 42.7(2015):708011. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。