中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The application of ptychography in the field of high power laser

文献类型:会议论文

作者Wang Haiyan; Liu Cheng; Pan Xingchen; Zhu Jianqiang
出版日期2015
会议名称20th international symposium on high power laser systems and applications (hpls and a)
通讯作者liu, c (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china.
英文摘要the commonly used interferometer and hartmann-shack sensor are not ideally qualified for the phase or wavefront measurement in the field of high power laser because the optical elements always have large aperture, the steep phase gradient and very irregular surface profile. the ptychography, which is a newly developed coherent diffraction method for the imaging with short wavelength, can be a perfect alternative to traditional technologies due to its outstanding advantages. the complex transmittance of the optical element can be obtained by measuring its transmitted and incident fields with ptychography and calculating their phase difference. since ptychography can realize measurement with a resolution comparable to that of interferometry, it can find lots of applications in the field of high power laser such as the measurement of the complex transmittance of large optical element, the thermal distortion of the gas-cooled nd:glass amplifier, and the focal length of the lens array etc.
收录类别CPCI
会议录proc.spie
会议录出版者spie-int soc optical engineering
语种英语
源URL[http://ir.siom.ac.cn/handle/181231/17173]  
专题上海光学精密机械研究所_高功率激光物理国家实验室
作者单位1.[Wang Haiyan
2.Liu Cheng
3.Pan Xingchen
4.Zhu Jianqiang] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
推荐引用方式
GB/T 7714
Wang Haiyan,Liu Cheng,Pan Xingchen,et al. The application of ptychography in the field of high power laser[C]. 见:20th international symposium on high power laser systems and applications (hpls and a).

入库方式: OAI收割

来源:上海光学精密机械研究所

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