Laser Induced Damage of SiO2 and CaF2 under 263nm
文献类型：会议论文
| 作者 | Jiang, Xiuqing; Liu, Dong; Ji, Lailin; Tang, Shunxing; Guo, Yajing; Zhu, Baoqiang; Gao, Yanqi; Lin, Zunqi |
| 出版日期 | 2015 |
| 会议名称 | 4th pacific rim laser damage symposium on optical materials for high-power lasers |
| 通讯作者 | jiang, xq (reprint author), chinese acad sci, natl lab high power laser & phys, shanghai inst opt & fine mech, shanghai 201800, peoples r china. |
| 英文摘要 | laser damage performance of large aperture optical components has been study under fourth harmonic of 1053nm nd:glass laser irradiation (263nm). the threshold of optical components is very low under 263nm laser irradiation, due to conversion of beam to higher energy photons of the quadrupled frequency (4 omega), and is relative to material characteristic. a preliminary test of laser induced damage in fused silica (sio2) and caf2 under 263nm laser is reported in this article. thresholds of these two materials are obtained. laser damage threshold of sio2 is found about 2 j/ m(2) by 1- on-1 method using pulsed 263nm laser, lower than caf2 whose threshold. |
| 收录类别 | CPCI |
| 会议录 | pacific rim laser damage 2015: optical materials for high-power lasers
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17181]  |
| 专题 | 上海光学精密机械研究所_高功率激光物理国家实验室 |
| 作者单位 | 1.[Jiang, Xiuqing 2.Tang, Shunxing 3.Guo, Yajing 4.Zhu, Baoqiang 5.Lin, Zunqi] Chinese Acad Sci, Natl Lab High Power Laser & Phys, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 6.[Jiang, Xiuqing] Univ Chinese Acad Sci, Beijing 100049, Peoples R China 7.[Liu, Dong 8.Ji, Lailin] China Acad Engn Phys, Shanghai Inst Laser Plasma, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Jiang, Xiuqing,Liu, Dong,Ji, Lailin,et al. Laser Induced Damage of SiO2 and CaF2 under 263nm[C]. 见:4th pacific rim laser damage symposium on optical materials for high-power lasers. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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