Manipulation of heat-diffusion channel in laser thermal lithography
文献类型：期刊论文
| 作者 | Wei, Jingsong; Wang, Yang; Wu, Yiqun |
| 刊名 | opt. express
 |
| 出版日期 | 2014 |
| 卷号 | 22期号:26页码:32470 |
| 关键词 | GE2SB2TE5 THIN-FILMS PHASE-CHANGE ETCHING CHARACTERISTICS FABRICATION PHOTOLITHOGRAPHY MEMORY |
| 通讯作者 | wei, js (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china. |
| 英文摘要 | laser thermal lithography is a good alternative method for forming small pattern feature size by taking advantage of the structural-change threshold effect of thermal lithography materials. in this work, the heat-diffusion channels of laser thermal lithography are first analyzed, and then we propose to manipulate the heat-diffusion channels by inserting thermal conduction layers in between channels. heat-flow direction can be changed from the in-plane to the out-of-plane of the thermal lithography layer, which causes the size of the structural-change threshold region to become much smaller than the focused laser spot itself; thus, nanoscale marks can be obtained. samples designated as "glass substrate/thermal conduction layer/thermal lithography layer (100 nm)/thermal conduction layer" are designed and prepared. chalcogenide phase-change materials are used as thermal lithography layer, and si is used as thermal conduction layer to manipulate heat-diffusion channels. laser thermal lithography experiments are conducted on a home-made high-speed rotation direct laser writing setup with 488 nm laser wavelength and 0.90 numerical aperture of converging lens. the writing marks with 50-60 nm size are successfully obtained. the mark size is only about 1/13 of the focused laser spot, which is far smaller than that of the light diffraction limit spot of the direct laser writing setup. this work is useful for nanoscale fabrication and lithography by exploiting the far-field focusing light system. (c) 2014 optical society of america |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/13449]  |
| 专题 | 上海光学精密机械研究所_高密度光存储技术实验室 |
| 作者单位 | 1.[Wei, Jingsong 2.Wang, Yang 3.Wu, Yiqun] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wei, Jingsong,Wang, Yang,Wu, Yiqun. Manipulation of heat-diffusion channel in laser thermal lithography[J]. opt. express,2014,22(26):32470. |
| APA | Wei, Jingsong,Wang, Yang,&Wu, Yiqun.(2014).Manipulation of heat-diffusion channel in laser thermal lithography.opt. express,22(26),32470. |
| MLA | Wei, Jingsong,et al."Manipulation of heat-diffusion channel in laser thermal lithography".opt. express 22.26(2014):32470. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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