氧杂质及热处理过程对Ge-Sb-Te薄膜的光学性质和晶体结构的影响
文献类型：期刊论文
| 作者 | 顾四朋; 侯立松; 刘波; 陈静 |
| 刊名 | 中国激光
 |
| 出版日期 | 2003 |
| 卷号 | 30期号:12页码:1111 |
| 其他题名 | Optical and Structural Properties of Oxygen-doped and Annealed Ge-Sb-Te Thin Films |
| 中文摘要 | 研究了氧掺杂Ge-Sb-Te磁控溅射相变薄膜在400 ～ 800 nm区域的光学常数（n,k），发现不同氧成分薄膜的光学性质有较大差别，经过热处理后薄膜的光学性质也发生了较大变化。由热处理前后薄膜的X射线衍射（XRD）发现，经过退火处理后薄膜发生了从非晶态到晶态的相变。由薄膜内应力变化和薄膜的结构变化解释了薄膜光学性质的变化。 |
| 英文摘要 | Optical properties of oxygen-doped Ge-Sb-Te thin films prepared by RF-sputtering method in the region of 400^800 nm were studied, including refractive index, extinction coefficient. The results show that optical constants of the Ge-Sb-Te-0 films change with oxygen content and heat-treatment. XRD spectra of the films with different oxygen content in the as-deposited and heat-treated states show that the films changed from amorphous to crystalline states due to heat-treatment. The effect of the strain field induced by oxygen-doping on optical properties is discussed. |
| 收录类别 | EI |
| 语种 | 中文 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/18426]  |
| 专题 | 上海光学精密机械研究所_高密度光存储技术实验室 |
| 作者单位 | 1.Gu Sipeng, Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800, China. 2.Hou Lisong, Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800, China. 3.Liu Bo, Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800, China. 4.Chen Jing, National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, The Chinese Academy of Sciences, Shanghai 200083, China. |
| 推荐引用方式 GB/T 7714 | 顾四朋,侯立松,刘波,等. 氧杂质及热处理过程对Ge-Sb-Te薄膜的光学性质和晶体结构的影响[J]. 中国激光,2003,30(12):1111. |
| APA | 顾四朋,侯立松,刘波,&陈静.(2003).氧杂质及热处理过程对Ge-Sb-Te薄膜的光学性质和晶体结构的影响.中国激光,30(12),1111. |
| MLA | 顾四朋,et al."氧杂质及热处理过程对Ge-Sb-Te薄膜的光学性质和晶体结构的影响".中国激光 30.12(2003):1111. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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