一种软X射线多层膜界面粗糙度的计算方法
文献类型：期刊论文
| 作者 | 冯仕猛; 赵海鹰; 黄梅珍; 范正修; 邵建达; 窦晓鸣 |
| 刊名 | 光学学报
 |
| 出版日期 | 2003 |
| 卷号 | 23期号:8页码:980 |
| 其他题名 | A method of calculating interfacial roughness of multilayers for soft x-ray |
| 中文摘要 | 提出一个利用多层膜小角X射线衍射谱衍射峰积分强度计算多层膜界面粗糙度的公式。用磁控溅射技术制备Mo／Si多层膜，用波长为0.154nm的硬X射线测量样品在小掠入射角区的衍射曲线，分别用本文公式和反射率曲线拟合方法计算了样品的界面粗糙度。实验结果表明：由本文公式获得的界面粗糙度近似于拟合方法获得的界面粗糙度，它们略等于多层膜界面实际粗糙度。 |
| 英文摘要 | A simple formula for calculating the interfacial roughness of multilayer by using the small angle X-ray diffraction curves of the samples is given. The Mo/Si multilayer is prepared by using the magnetron sputtering, and the small X-ray diffraction spectrum for the multilayer is measured by using X-ray with the wavelength of 0. 154 nm. The interfacial roughness are given by the combination of the formula with the small angle X-ray diffraction spectrum, and fitting the measured spectrum to the theoretical diffraction spectrum respectively. The results show that the calculated data of the interfacial roughness from the formula is closer to that given by fitting curve, which equals the real roughness of Mo/Si multilayer. |
| 收录类别 | EI |
| 语种 | 中文 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/18237]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 作者单位 | 1.Feng shimeng, Physics Department,Shanghai Jiaotong University, Shanghai China. 2.Zhao Haiying, Physics Department,Shanghai Jiaotong University, Shanghai China. 3.Huang Meizhen, Physics Department,Shanghai Jiaotong University, Shanghai China. 4.Dou Xiaoming, Physics Department,Shanghai Jiaotong University, Shanghai China. 5.fan Zhengxiu, Shanghai Institute of Optics and Fine mechanics,The Chinese Academy of Sciences, Shanghai 201800, China. 6.Shao Jianda, Shanghai Institute of Optics and Fine mechanics,The Chinese Academy of Sciences, Shanghai 201800, China. |
| 推荐引用方式 GB/T 7714 | 冯仕猛,赵海鹰,黄梅珍,等. 一种软X射线多层膜界面粗糙度的计算方法[J]. 光学学报,2003,23(8):980. |
| APA | 冯仕猛,赵海鹰,黄梅珍,范正修,邵建达,&窦晓鸣.(2003).一种软X射线多层膜界面粗糙度的计算方法.光学学报,23(8),980. |
| MLA | 冯仕猛,et al."一种软X射线多层膜界面粗糙度的计算方法".光学学报 23.8(2003):980. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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