Dynamic scaling in growth of ZrO2 thin films prepared by electronic beam evaporation
文献类型：期刊论文
| 作者 | Qi HJ(齐红基); Huang LH(黄立华); Yuan JM(袁景梅); Cheng CF(程传福); Shao JD(邵建达); Fan ZX(范正修) |
| 刊名 | chin. phys. lett.
 |
| 出版日期 | 2003 |
| 卷号 | 20期号:5页码:709 |
| 通讯作者 | qi, hj (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china |
| 英文摘要 | the growth front evolution of zro2 thin elms deposited by electronic beam evaporation has been studied with atomic force microscopy. the dynamic scaling characteristics are observed during the deposition process. after numerical correlation analysis, the roughness exponent alpha = 0.80 +/-0.005 and the growth exponent beta = 0.141 are all obtained. based on these results, we suggest that the growth of zro2 thin elms can be described by the combination of the edwards-wilkinson equation, the mullins diffusion equation and the shadowing effect. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000182922700034 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/18459]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Huazhong Univ Sci & Technol, Laser Technol & Engn Res Inst, Wuhan 430074, Peoples R China |
| 推荐引用方式 GB/T 7714 | Qi HJ,Huang LH,Yuan JM,et al. Dynamic scaling in growth of ZrO2 thin films prepared by electronic beam evaporation[J]. chin. phys. lett.,2003,20(5):709. |
| APA | 齐红基,黄立华,袁景梅,程传福,邵建达,&范正修.(2003).Dynamic scaling in growth of ZrO2 thin films prepared by electronic beam evaporation.chin. phys. lett.,20(5),709. |
| MLA | 齐红基,et al."Dynamic scaling in growth of ZrO2 thin films prepared by electronic beam evaporation".chin. phys. lett. 20.5(2003):709. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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