亚稳态氖原子光刻的实验研究
文献类型：期刊论文
| 作者 | 霍芸生; 蔡惟泉; 曾庆林; 鄢和明; 王育竹 |
| 刊名 | 中国激光
 |
| 出版日期 | 2003 |
| 卷号 | 30期号:1页码:22 |
| 其他题名 | Experimental Study on Metastable-neon Atom Lithography |
| 中文摘要 | 用亚稳态氖原子束进行了原子光刻实验。用栅网作掩膜，以扩散泵油的有机分子在高能亚稳态氖原子作用下所生成的碳膜作抗蚀剂，在硅片上刻蚀出分辨率为2 mum的微结构，为进一步的纳米级原子光刻技术的研究打下了基础。 |
| 英文摘要 | The atomic-lithograph experiments were carried out by use of a metastable neon atomic beam. Metallic meshes were used as masks, and the carbon films produced from the organic molecules of diffusion-pump oil, which were adsorbed on the surface of wafers and exposed to the high energy metastable neon atomic beams. The microstructures on the silicon wafers with the resolution of microns were obtained. |
| 收录类别 | EI |
| 语种 | 中文 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/18383]  |
| 专题 | 上海光学精密机械研究所_量子光学重点实验室 |
| 作者单位 | 1.Huo Yunsheng, Laboratory for Quantum Optics, Shanghai Institute of optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800, China. 2.Cai Weiquan, Laboratory for Quantum Optics, Shanghai Institute of optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800, China. 3.Zeng Qinglin, Laboratory for Quantum Optics, Shanghai Institute of optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800, China. |
| 推荐引用方式 GB/T 7714 | 霍芸生,蔡惟泉,曾庆林,等. 亚稳态氖原子光刻的实验研究[J]. 中国激光,2003,30(1):22. |
| APA | 霍芸生,蔡惟泉,曾庆林,鄢和明,&王育竹.(2003).亚稳态氖原子光刻的实验研究.中国激光,30(1),22. |
| MLA | 霍芸生,et al."亚稳态氖原子光刻的实验研究".中国激光 30.1(2003):22. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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