Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers
文献类型：期刊论文
| 作者 | Jia, TQ; Xu, ZZ; Li, XX; Li, RX; Shuai, B; Zhao, FL |
| 刊名 | appl. phys. lett.
 |
| 出版日期 | 2003 |
| 卷号 | 82期号:24页码:4382 |
| 通讯作者 | jia, tq (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab high intens opt, pob 800-211, shanghai 201800, peoples r china |
| 英文摘要 | we report measurements of damage threshold and ablation depth for sio2 and caf2 irradiated under lasers at wavelengths of 800 and 400 nm for duration of 45-800 fs. these results can be well understood by using a developed avalanche model. the model includes the production of conduction band electrons (cbes), laser energy deposition, and cbe diffusion. the evolution of microexplosion is investigated based on this model. (c) 2003 american institute of physics. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000183467500057 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/18456]  |
| 专题 | 上海光学精密机械研究所_强场激光物理国家重点实验室 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab High Intens Opt, Shanghai 201800, Peoples R China 2.Zhongshan Univ, State Key Lab Opt & Elect Mat & Technol, Guangzhou 510275, Peoples R China |
| 推荐引用方式 GB/T 7714 | Jia, TQ,Xu, ZZ,Li, XX,et al. Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers[J]. appl. phys. lett.,2003,82(24):4382. |
| APA | Jia, TQ,Xu, ZZ,Li, XX,Li, RX,Shuai, B,&Zhao, FL.(2003).Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers.appl. phys. lett.,82(24),4382. |
| MLA | Jia, TQ,et al."Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers".appl. phys. lett. 82.24(2003):4382. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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