Direct Laser Writing Facility for Fabrication of Submicron Mask
文献类型：期刊论文
| 作者 | Zhu F(朱锋); Ma JY(麻健勇) |
| 刊名 | chin. phys. lett.
 |
| 出版日期 | 2014 |
| 卷号 | 31期号:4页码:48102 |
| 关键词 | DIFFRACTIVE OPTICAL-ELEMENTS RAPID FABRICATION CONTINUOUS-RELIEF LITHOGRAPHY SYSTEM GLASS |
| 通讯作者 | ma, jy (reprint author), chinese acad sci, shanghai inst opt & fine mech, informat opt lab, shanghai 201800, peoples r china. |
| 英文摘要 | direct laser writing technique has become a well-established, multi-functional and flexible method for fabricating high quality diffractive optical elements. we propose and build a maskless direct laser writing system with the ability to produce a sub-micron feature size. the high precision lithography is realized by using the astigmatic autofocus method. the minimum feature size of the system, breaking through the diffraction limit with the chromium layer, can achieve 300 nm with the 405 nm blue laser. a 50 x 50 mm(2) chromium grating mask with a period of 1 mu m and line width of 300 nm is fabricated. this facility will be useful for the fabrication of large-scale submicron diffraction optical elements in the future. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/13088]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Zhu Feng 2.Ma Jian-Yong] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Informat Opt Lab, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhu F,Ma JY. Direct Laser Writing Facility for Fabrication of Submicron Mask[J]. chin. phys. lett.,2014,31(4):48102. |
| APA | 朱锋,&麻健勇.(2014).Direct Laser Writing Facility for Fabrication of Submicron Mask.chin. phys. lett.,31(4),48102. |
| MLA | 朱锋,et al."Direct Laser Writing Facility for Fabrication of Submicron Mask".chin. phys. lett. 31.4(2014):48102. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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