Aberration measurement technique based on an analytical linear model of a through-focus aerial image
文献类型:期刊论文
作者 | Yan, Guanyong; Wang, Xiangzhao; Li, Sikun; Yang, Jishuo; Xu, Dongbo; Erdmann, Andreas |
刊名 | opt. express
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出版日期 | 2014 |
卷号 | 22期号:5页码:5623 |
关键词 | NIJBOER-ZERNIKE APPROACH POINT-SPREAD FUNCTIONS PHASE-SHIFTING MASK LITHOGRAPHIC TOOLS PROJECTION OPTICS COMA MEASUREMENT ILLUMINATION COMPUTATION |
通讯作者 | wang, xz (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china. |
英文摘要 | we propose an in situ aberration measurement technique based on an analytical linear model of through-focus aerial images. the aberrations are retrieved from aerial images of six isolated space patterns, which have the same width but different orientations. the imaging formulas of the space patterns are investigated and simplified, and then an analytical linear relationship between the aerial image intensity distributions and the zernike coefficients is established. the linear relationship is composed of linear fitting matrices and rotation matrices, which can be calculated numerically in advance and utilized to retrieve zernike coefficients. numerical simulations using the lithography simulators prolith and dr.litho demonstrate that the proposed method can measure wavefront aberrations up to z(37). experiments on a real lithography tool confirm that our method can monitor lens aberration offset with an accuracy of 0.7 nm. (c)2014 optical society of america |
收录类别 | SCI |
语种 | 英语 |
版本 | 出版稿 |
源URL | [http://ir.siom.ac.cn/handle/181231/13703] ![]() |
专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
作者单位 | 1.[Yan, Guanyong 2.Wang, Xiangzhao 3.Li, Sikun 4.Yang, Jishuo] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China 5.[Yan, Guanyong 6.Wang, Xiangzhao 7.Yang, Jishuo] Univ Chinese Acad Sci, Beijin |
推荐引用方式 GB/T 7714 | Yan, Guanyong,Wang, Xiangzhao,Li, Sikun,et al. Aberration measurement technique based on an analytical linear model of a through-focus aerial image[J]. opt. express,2014,22(5):5623. |
APA | Yan, Guanyong,Wang, Xiangzhao,Li, Sikun,Yang, Jishuo,Xu, Dongbo,&Erdmann, Andreas.(2014).Aberration measurement technique based on an analytical linear model of a through-focus aerial image.opt. express,22(5),5623. |
MLA | Yan, Guanyong,et al."Aberration measurement technique based on an analytical linear model of a through-focus aerial image".opt. express 22.5(2014):5623. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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