Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging
文献类型：期刊论文
| 作者 | Shen, Lina; Li, Sikun; Wang, Xiangzhao; Yan, Guanyong |
| 刊名 | j. micro-nanolithogr. mems moems
 |
| 出版日期 | 2015 |
| 卷号 | 14期号:4页码:43504 |
| 通讯作者 | wang, xz (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china. |
| 英文摘要 | in high-numerical aperture (na) and hyper-na lithography systems, the polarization aberration of the projection lens leads to imaging degradations. typically, commercial simulators, which usually entail relatively higher computing cost and lack sufficient theoretical support, are used to explore the relationship. analytical analysis of the impact of polarization aberration of the projection lens on the aerial image is performed. in the analysis process, an alternating phase-shift mask is used, and different components of the linear polarized illumination light vector are considered. the analytical expressions of image placement error (ipe) and best focus shift (bfs) caused by polarization aberration are derived from the intensity of the aerial image. the linear relationships between ipe and odd pauli-zernike polarization aberrations as well as that between bfs and even pauli-zernike polarization aberrations are established. moreover, the polarization aberration sensitivities are given and compared when different components of the linear polarized illumination light vector are adopted. all derived expressions match simulation results well and can be used to understand more fully the detrimental impact of polarization aberration on lithographic imaging. the accuracy of the linear relationships is assessed by the least square method. (c) 2015 society of photo-optical instrumentation engineers (spie) |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/14162]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Shen, Lina 2.Li, Sikun 3.Wang, Xiangzhao 4.Yan, Guanyong] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China 5.[Shen, Lina] Xinjiang Normal Univ, Inst Phys & Elect Engn, Xinjiang 830000, Urumchi, Peoples R China |
| 推荐引用方式 GB/T 7714 | Shen, Lina,Li, Sikun,Wang, Xiangzhao,et al. Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging[J]. j. micro-nanolithogr. mems moems,2015,14(4):43504. |
| APA | Shen, Lina,Li, Sikun,Wang, Xiangzhao,&Yan, Guanyong.(2015).Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging.j. micro-nanolithogr. mems moems,14(4),43504. |
| MLA | Shen, Lina,et al."Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging".j. micro-nanolithogr. mems moems 14.4(2015):43504. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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