In situ aberration measurement method using a phase-shift ring mask
文献类型：期刊论文
| 作者 | Li, Sikun; Wang, Xiangzhao; Yang, Jishuo; Duan, Lifeng; Tang, Feng; Yan, Guanyong |
| 刊名 | j. micro-nanolithogr. mems moems
 |
| 出版日期 | 2015 |
| 卷号 | 14期号:1页码:11005 |
| 通讯作者 | wang, xz (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china. |
| 英文摘要 | an in situ aberration measurement method using a phase-shift ring mask is proposed for a lithographic projection lens whose numerical aperture is below 0.8. in this method, two-dimensional phase-shift rings are designed as the measurement mask. a linear relationship model between the intensity distribution of the lateral aerial image and the aberrations is built by principal component analysis and multivariate linear regression analyses. compared with the principal component analysis of the aerial images (amai-pca) method, in which a binary mask and through-focus aerial images are used for aberration extraction, the aerial images of the phase-shift ring mask contain more useful information, providing the possibility to eliminate the crosstalk between different kinds of aberrations. therefore, the accuracy of the aberration measurement is improved. simulations with the lithography simulator dr. litho showed that the accuracy is improved by 15% and five more zemike aberrations can be measured compared with the standard amai-pca. moreover, the proposed method requires less measured aerial images and is faster than the amai-pca. (c) 2015 society of photo-optical instrumentation engineers (spie) |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/14194]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Li, Sikun 2.Wang, Xiangzhao 3.Yang, Jishuo 4.Tang, Feng 5.Yan, Guanyong] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China 6.[Wang, Xiangzhao 7.Yang, Jishuo 8.Tang, Feng 9.Yan, Guanyong] Univ Chinese Acad Sci, Beijing 100039, Peoples R China 10.[Duan, Lifeng] Shanghai Micro Elect Equipment Co Ltd, Dept Syst Engn, Shanghai 201203, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Sikun,Wang, Xiangzhao,Yang, Jishuo,et al. In situ aberration measurement method using a phase-shift ring mask[J]. j. micro-nanolithogr. mems moems,2015,14(1):11005. |
| APA | Li, Sikun,Wang, Xiangzhao,Yang, Jishuo,Duan, Lifeng,Tang, Feng,&Yan, Guanyong.(2015).In situ aberration measurement method using a phase-shift ring mask.j. micro-nanolithogr. mems moems,14(1),11005. |
| MLA | Li, Sikun,et al."In situ aberration measurement method using a phase-shift ring mask".j. micro-nanolithogr. mems moems 14.1(2015):11005. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。