High-order aberration measurement technique based on a quadratic Zernike model with optimized source
文献类型：期刊论文
| 作者 | Yang, Jishuo; Wang, Xiangzhao; Li, Sikun; Duan, Lifeng; Yan, Guanyong; Xu, Dongbo; Bourov, Anatoly Y.; Erdmann, Andreas |
| 刊名 | opt. eng.
 |
| 出版日期 | 2013 |
| 卷号 | 52期号:5页码:53603 |
| 通讯作者 | yang, js (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china. |
| 英文摘要 | in this paper, we propose an aberration metrology (am) of a lithographic projection lens based on aerial images (ai) by using a quadratic relationship model (quad) between the aerial-image intensity distribution and the zernike coefficients. the proposed method (amai-quad) uses principal component analysis and multiple linear regression analyses for model generation. the quadratic model is, then, used to extract zernike coefficients by a nonlinear least-squares minimizing technique. the best linear constrain condition is estimated by optimizing the illumination settings. compared with earlier techniques, based on a linear relationship between zernike coefficients and ais, the new method can extend the orders of zernike coefficients measured. the application of amai-quad to ais, computed by lithography simulators prolith and dr. litho, demonstrated an extension of measurement range to 90m lambda and an enhancement of measurement accuracy by more than 30 percent. (c) 2013 society of photo-optical instrumentation engineers (spie) |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/14732]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Yang, Jishuo 2.Wang, Xiangzhao 3.Li, Sikun 4.Yan, Guanyong 5.Xu, Dongbo] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China 6.[Yang, Jishuo 7.Yan, Guanyong] Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China 8.[Duan, Lifeng 9.Bourov, Anatoly Y.] Shanghai Microelect Equipment Co, Shanghai 201203, Peoples R China 10.[Erdmann, Andreas] Fraunhofer Inst Integrated Syst & Device Technol, D-91058 Erlangen, Germany |
| 推荐引用方式 GB/T 7714 | Yang, Jishuo,Wang, Xiangzhao,Li, Sikun,et al. High-order aberration measurement technique based on a quadratic Zernike model with optimized source[J]. opt. eng.,2013,52(5):53603. |
| APA | Yang, Jishuo.,Wang, Xiangzhao.,Li, Sikun.,Duan, Lifeng.,Yan, Guanyong.,...&Erdmann, Andreas.(2013).High-order aberration measurement technique based on a quadratic Zernike model with optimized source.opt. eng.,52(5),53603. |
| MLA | Yang, Jishuo,et al."High-order aberration measurement technique based on a quadratic Zernike model with optimized source".opt. eng. 52.5(2013):53603. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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