光刻机光瞳整形衍射光学元件远场多参数检测方法
文献类型：期刊论文
| 作者 | 胡中华; 朱菁; 杨宝喜; 彭雪峰; 曾爱军; 黄惠杰 |
| 刊名 | 中国激光
 |
| 出版日期 | 2013 |
| 卷号 | 40期号:9页码:908001 |
| 其他题名 | Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System |
| 通讯作者 | Hu Zhonghua, Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences, Shanghai 201800, China. ; Zhu Jing, Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences, Shanghai 201800, China. ; Yang Baoxi, Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences, Shanghai 201800, China. ; Peng Xuesong, Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences, Shanghai 201800, China. ; Zeng Aijun, Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences, Shanghai 201800, China. ; Huang Huijie, Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences, Shanghai 201800, China. |
| 中文摘要 | 光刻机光瞳整形普遍采用衍射光学元件(DOE)来产生各种照明模式。针对其光学特性的检测需求，提出了一种光刻机光瞳整形DOE远场多参数检测方法。该方法通过对远场光强分布进行转换，可同时获得DOE远场衍射图样的极平衡性、极张角、极方位角、半孔径角和径向光强分布等多种光学特性参数。实验中，对国外加工的产生四极照明模式的DOE进行了远场多参数检测与分析，结果表明该方法可以满足光刻机光瞳整形DOE的检测要求。 |
| 英文摘要 | Diffractive optical element (DOE) is widely used to generate various illumination modes for pupil shaping in the lithography system. A far-field multi-parameter measuring method for the DOE is proposed according to its testing requirements of optical performance. The multi-parameters of optical performance, such as the pole balance, the pole opening angle, the pole azimuth angle, the semi-aperture angle, and the radial intensity distribution are obtained simultaneously by converting the far-field intensity distribution. The multi-parameter measurement and analysis of DOE made abroad are done experimentally. And the experimental results indicate that this measuring method can be applied to the testing of DOE for pupil shaping in the lithography system. |
| 收录类别 | EI |
| 语种 | 中文 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/15043]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.胡中华, 中科院上海光学与精密机械研究所信息光学与光电技术实验室, 上海 201800, 中国. 2.朱菁, 中科院上海光学与精密机械研究所信息光学与光电技术实验室, 上海 201800, 中国. 3.杨宝喜, 中科院上海光学与精密机械研究所信息光学与光电技术实验室, 上海 201800, 中国. 4.彭雪峰, 中科院上海光学与精密机械研究所信息光学与光电技术实验室, 上海 201800, 中国. 5.曾爱军, 中科院上海光学与精密机械研究所信息光学与光电技术实验室, 上海 201800, 中国. 6.黄惠杰, 中科院上海光学与精密机械研究所信息光学与光电技术实验室, 上海 201800, 中国. |
| 推荐引用方式 GB/T 7714 | 胡中华,朱菁,杨宝喜,等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光,2013,40(9):908001. |
| APA | 胡中华,朱菁,杨宝喜,彭雪峰,曾爱军,&黄惠杰.(2013).光刻机光瞳整形衍射光学元件远场多参数检测方法.中国激光,40(9),908001. |
| MLA | 胡中华,et al."光刻机光瞳整形衍射光学元件远场多参数检测方法".中国激光 40.9(2013):908001. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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