A high accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror
文献类型：会议论文
| 作者 | Lu, Yunjun; Tang, Feng; Wang, Xiangzhao; Li, Yong; Wan, Xiulong; Guo, Fudong; Dai, Fengzhao |
| 出版日期 | 2014 |
| 会议名称 | conference on optical metrology and inspection for industrial applications iii held as part of spie/cos photonics asia |
| 通讯作者 | lu, yj (reprint author), shanghai inst opt & fine mech, lab informat opt & optoelect technol, 390 qinghe rd, shanghai 201800, peoples r china. |
| 英文摘要 | nonflatness of stage mirror surface affects the position accuracy of the wafer stage in lithography tool. precise surface flatness measurement is needed for the computer controlled polishing of stage mirror. a subaperture stitching system using a commercial 4-inch fizeau interferometer was presented in this paper. absolute test was used to calibrate the surface figure of the reference mirror with the accuracy better than lambda/100 pv (lambda = 632.8nm). subaperture stitching was used to extend the measurement aperture larger than 450x50mm. stitching measurements were carried out for stage mirrors during surface polishing. comparison tests were also made with a 24-inch interferometer. the results show that the stitching system has the advantages of larger dynamic range, higher spatial resolution, and better measurement accuracy in local area. |
| 收录类别 | CPCI |
| 会议录 | optical metrology and inspection for industrial applications iii
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17231]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Lu, Yunjun 2.Tang, Feng 3.Wang, Xiangzhao 4.Li, Yong 5.Wan, Xiulong 6.Guo, Fudong 7.Dai, Fengzhao] Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Lu, Yunjun,Tang, Feng,Wang, Xiangzhao,et al. A high accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror[C]. 见:conference on optical metrology and inspection for industrial applications iii held as part of spie/cos photonics asia. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。