Calibration of system errors in lateral shearing interferometer for EUV-wavefront metrology
文献类型：会议论文
| 作者 | Li, Jie; Tang, Feng; Wang, Xiangzhao; Dai, Fengzhao; Wu, Feibin |
| 出版日期 | 2015 |
| 会议名称 | conference on extreme ultraviolet (euv) lithography vi |
| 通讯作者 | li, j (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china. |
| 英文摘要 | a new systematic error calibration method in lateral shearing interferometry (lsi) is proposed for extreme ultraviolet lithography. this method is used to remove the most significant errors: geometric optical path difference (opd) and detector tilt error. the difference fronts of 0th and +/- 1st order diffracted waves are used to reconstruct wavefront. the zernike coefficients of the reconstructed wavefront are used to calculate the distance among different diffracted light converging points (d). the difference front of 0th and +1st order diffracted waves is mirrored and added to the difference front of 0th and -1st order diffracted waves. the sum is used to calculate detector tilt angle. the geometric opd and detector-tilt induced systematic errors are removed based on the calculated d and detector tilt angle. simulations show that the root-mean-square (rms) value of the residual systematic error is smaller than 0.1nm. the proposed method can be used to accurately measure the aberration of euv optics with large numerical aperture (na 0.5) in lsi. |
| 收录类别 | CPCI |
| 会议录 | extreme ultraviolet (euv) lithography vi
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17232]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Li, Jie 2.Tang, Feng 3.Wang, Xiangzhao 4.Dai, Fengzhao 5.Wu, Feibin] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China 6.[Li, Jie 7.Wang, Xiangzhao 8.Wu, Feibin] Univ Chinese Acad Sci, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Jie,Tang, Feng,Wang, Xiangzhao,et al. Calibration of system errors in lateral shearing interferometer for EUV-wavefront metrology[C]. 见:conference on extreme ultraviolet (euv) lithography vi. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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