Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality
文献类型：会议论文
| 作者 | Shen, Lina; Li, Sikun; Wang, Xiangzhao; Yan, Guanyong |
| 出版日期 | 2015 |
| 会议名称 | conference on optical microlithography xxviii |
| 通讯作者 | wang, xz (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china. |
| 英文摘要 | in high-na and hyper-na lithography systems, the polarization aberration of projection lens leads to imaging degradations. typically, numerical simulations are used to explore the relationship. in this paper, analytical analysis for the impact of polarization aberration of projection lens on the aerial image of alternating phase-shift mask (alt-psm) is realized. the analytical expressions of image placement error (ipe) and best focus shift (bfs) caused by polarization aberration are derived from the intensity of aerial image. the derived expressions match simulation results extremely well, and can be used to understand more fully the detrimental impact of polarization aberration on lithographic imaging quality. the linear relationships between ipe and odd items of pauli-zernike polarization aberrations, as well as that between bfs and even items of pauli-zernike polarization aberrations are established, using linear polarization illumination. the accuracy of the linear relationships is assessed by the least square method. |
| 收录类别 | CPCI |
| 会议录 | optical microlithography xxviii
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17233]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Shen, Lina 2.Li, Sikun 3.Wang, Xiangzhao 4.Yan, Guanyong] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China 5.[Shen, Lina 6.Li, Sikun 7.Wang, Xiangzhao 8.Yan, Guanyong] Univ Chinese Acad Sci, Beijing 100049, Peoples R China 9.[Shen, Lina] Xinjiang Normal Univ, Inst Phys & Elect Engn, Xinjiang 830000, Urumchi, Peoples R China |
| 推荐引用方式 GB/T 7714 | Shen, Lina,Li, Sikun,Wang, Xiangzhao,et al. Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality[C]. 见:conference on optical microlithography xxviii. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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