Design and simulation of illuminator with micro scanning slit array for NA 0.75 lithography system
文献类型：会议论文
| 作者 | Zhu, Linglin; Zeng, Aijun; Zhang, Shanhua; Fang, Ruifang; Huang, Huijie |
| 出版日期 | 2013 |
| 会议名称 | conference on optical microlithography xxvi |
| 通讯作者 | zeng, aj (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china. |
| 英文摘要 | an illuminator with a micro scanning slit array for na 0.75 lithography system has been proposed in this paper. in this illuminator, the beam is shaped by a diffractive optical element (doe), a zoom and axicon lenses. the beam is homogenized by a micro intergrator rod array. the micro scanning slit array is used to substitute for the traditional internal rema. a micro lens array and a condenser image the micro scanning slit array onto the mask. this illuminator needs no illumination lens group and reduces the effect of the vibration introduced by the internal rema. the illuminator is designed and simulated. the result shows that the illuminating field on the mask has good uniformity and trapezoidal distribution along the scanning direction. the feasibility of the illuminator is verified. |
| 收录类别 | CPCI |
| 会议录 | optical microlithography xxvi
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17259]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Zhu, Linglin 2.Zeng, Aijun 3.Zhang, Shanhua 4.Fang, Ruifang 5.Huang, Huijie] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhu, Linglin,Zeng, Aijun,Zhang, Shanhua,et al. Design and simulation of illuminator with micro scanning slit array for NA 0.75 lithography system[C]. 见:conference on optical microlithography xxvi. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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