The beam delivery modeling and error sources analysis of beam stabilization system for lithography
文献类型：会议论文
| 作者 | Wang, Jun; Huang, Lihua; Hou, Liying; He, Guojun; Ren, Bingqiang; Zeng, Aijun; Huang, Huijie |
| 出版日期 | 2013 |
| 会议名称 | international conference on optical instruments and technology - optoelectronic measurement technology and systems |
| 通讯作者 | wang, j (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china. |
| 英文摘要 | beam stabilization system is one of the most important units for lithography, which can accomplish displacement and pointing detection and control and includes beam measurement unit(bmu) and beam steering unit(bsu). our group has set up a beam stabilization system and verified preliminarily beam stabilization algorithm of precise control beam position and angle. in the article, we establish beam delivery mathematic model and analyze the system inherent error. this shows that the reason why image rotation effect arises at the output plane of beam stabilization is the fast steering mirror (fsm) rotation of bsu in the process of beam stabilization. two fsms rotation around 45 degrees axis of fsm make the most contribution to image rotation which rotates 1.414 mrad as two fsms rotation angle difference changes 1 mrad. it is found that error sources include three key points: fsm accuracy; measurement noise and beam translation by passing through of beam splitters changing as the ambient temperature changing. fsm accuracy leads to the maximum 13.2 mu m displacement error and 24.49 mu rad angle error. measurement inaccuracy as a result of 5 mu m measurement noise results in the maximum 0.126mm displacement error and 57.2 mu rad angle error. beam translation errors can be negligible if temperature is unchanged. we have achieved beam stability of about 15.5 mu rad for angle and 28 mu m for displacement (both 1 sigma) after correcting 2mm initial displacement deviation and 5mrad initial angle deviation with regard to the system rebuilt due to practical requirements. |
| 收录类别 | CPCI |
| 会议录 | 2013 international conference on optical instruments and technology: optoelectronic measurement technology and systems
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17264]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Wang, Jun 2.Huang, Lihua 3.Hou, Liying 4.He, Guojun 5.Ren, Bingqiang 6.Zeng, Aijun 7.Huang, Huijie] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Jun,Huang, Lihua,Hou, Liying,et al. The beam delivery modeling and error sources analysis of beam stabilization system for lithography[C]. 见:international conference on optical instruments and technology - optoelectronic measurement technology and systems. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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