In situ aberration measurement method using a phase-shift ring mask
文献类型：会议论文
| 作者 | Wang, Xiangzhao; Li, Sikun; Yang, Jishuo; Tang, Feng; Yan, Guanyong; Erdmann, Andreas |
| 出版日期 | 2014 |
| 会议名称 | 27th optical microlithography conference as part of the spie advanced lithography symposium |
| 通讯作者 | li, sk (reprint author), chinese acad sci, lab informat opt & optoelect technol, shanghai inst opt & fine mech, shanghai 201800, peoples r china. |
| 英文摘要 | an in situ aberration measurement method using a phase-shift ring mask is proposed for lithographic projection lenses. two dimensional (2d) phase-shift rings are designed as the measurement mask. a linear model between the aerial image intensity distribution and the aberrations is built by principal component analysis and multivariate linear regression analyses. compared with the amai-pca method, in which a binary mask and through-focus aerial images at are used for aberration extraction, the aerial images of the phase-shift ring mask contain more useful information. this provides the possibility to eliminate the crosstalk between different kinds of aberrations. therefore, the accuracy of aberration measurement is improved. simulations with the lithography simulator dr. litho showed that the accuracy is improved by 15% and 5 more zernike aberrations can be measured compared with amai-pca. moreover, the speed of aberration measurement is improved because less aerial images are required using the new 2d mask. |
| 收录类别 | CPCI |
| 会议录 | optical microlithography xxvii
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17267]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Wang, Xiangzhao 2.Li, Sikun 3.Yang, Jishuo 4.Tang, Feng 5.Yan, Guanyong] Chinese Acad Sci, Lab Informat Opt & Optoelect Technol, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Xiangzhao,Li, Sikun,Yang, Jishuo,et al. In situ aberration measurement method using a phase-shift ring mask[C]. 见:27th optical microlithography conference as part of the spie advanced lithography symposium. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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