A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask
文献类型：会议论文
| 作者 | Li, Sikun; Wang, Xiangzhao; Yang, Jishuo; Tang, Feng; Yan, Guanyong; Erdmann, Andreas |
| 出版日期 | 2014 |
| 会议名称 | 27th optical microlithography conference as part of the spie advanced lithography symposium |
| 通讯作者 | wang, xz (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab informat opt & optoelect technol, shanghai 201800, peoples r china. |
| 英文摘要 | an in situ aberration measurement method using a two dimensional (2d) phase-shift ring mask has been proposed for lithographic projection lenses, which is more accurate and faster than amai-pca method. the defocus of the aerial image of the 2d measurement mask is the main source of the measurement error of this method. in this paper, a defocus measurement method for the aberration measurement method is proposed, in which the residual of the principal component analysis process is used as the criterion. after the defocus is accurately measured, the most suitable linear relationship model, which plays a very important role in the aberration measurement method, can be determined. simulations with the lithography simulator dr.litho demonstrated that the accuracy of the defocus measurement method is approximately 1nm. the aberration measurement method can detect 12 zernike aberrations (z(5)similar to z(16)) with maximum systematic error of approximately 1m lambda, when the suitable linear relationship model is used. |
| 收录类别 | CPCI |
| 会议录 | optical microlithography xxvii
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17268]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Li, Sikun 2.Wang, Xiangzhao 3.Yang, Jishuo 4.Tang, Feng 5.Yan, Guanyong] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Sikun,Wang, Xiangzhao,Yang, Jishuo,et al. A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask[C]. 见:27th optical microlithography conference as part of the spie advanced lithography symposium. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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