Illumination system without scanning slit for lithographic tools
文献类型：会议论文
| 作者 | Zhang, Yunbo; Zeng, Aijun; Wang, Ying; Chen, Mingxing; Zhang, Shanhua; Yuan, Qiao; Huang, Huijie |
| 出版日期 | 2014 |
| 会议名称 | 27th optical microlithography conference as part of the spie advanced lithography symposium |
| 通讯作者 | zhang, yb (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china. |
| 英文摘要 | the step-and-scan lithographic illumination system has a scanning slit which could not only control the exposure field size but also assist the wafer to complete scanning process with high uniformity. the scanning slit is comprised by four blades which are drive by four electric actuators. this paper presents a 193nm lithographic illumination system without utilizing scanning slit. a microlens array, a micromirror array and a collimating lens are used to generated a certain intensity distribution on the surface of the aperture array. a fast scanning mirror is used in to change the position of the formed intensity distribution to change the illuniated area on the mask. that can realize lithographic scanning process without slit. |
| 收录类别 | CPCI |
| 会议录 | optical microlithography xxvii
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17269]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Zhang, Yunbo 2.Zeng, Aijun 3.Wang, Ying 4.Chen, Mingxing 5.Zhang, Shanhua 6.Yuan, Qiao 7.Huang, Huijie] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Yunbo,Zeng, Aijun,Wang, Ying,et al. Illumination system without scanning slit for lithographic tools[C]. 见:27th optical microlithography conference as part of the spie advanced lithography symposium. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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