Investigation on the static recording characteristic of super-resolution near-field structure with antimony mask layer
文献类型：期刊论文
| 作者 | Zhang F ; Xu WD(徐文东) ; Wang Y ; Gan FX(干福熹) |
| 刊名 | solid state commun.
 |
| 出版日期 | 2005 |
| 卷号 | 134期号:6页码:375 |
| 关键词 | antimony mask layer optical storage statics recording super-resolution near-field structure |
| ISSN号 | 0038-1098 |
| 中文摘要 | static recording characteristic of super-resolution near-field structure with antimony (sb) is investigated in this paper. the recording marks are observed by a scanning electron microscopy (sem), a high-resolution optical microscopy with a ccd camera and an atomic force microscopy (afm). the super-resolution mechanism is also analyzed based on these static recording marks. results show that the light reaching on recording layer is composed of two parts, one is the linear transmissive light (propagating field) and the other is the nonlinear evanescent light in the optical near field. the evanescent light may be greatly enhanced in the center of the spot because sb will transit from a semiconductor to a metal when it is melted under the high laser power irradiation. this local melted area in the spot center may be like a metal tip in the optical near field that can collect and enhance the information that is far beyond the diffraction limit, which leads to the super-resolution recording and readout. (c) 2005 elsevier ltd. all rights reserved. |
| 学科主题 | 光存储 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000228853400001 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/3839]  |
| 专题 | 上海光学精密机械研究所_高密度光存储技术实验室 |
| 推荐引用方式 GB/T 7714 | Zhang F,Xu WD,Wang Y,et al. Investigation on the static recording characteristic of super-resolution near-field structure with antimony mask layer[J]. solid state commun.,2005,134(6):375, 379. |
| APA | Zhang F,徐文东,Wang Y,&干福熹.(2005).Investigation on the static recording characteristic of super-resolution near-field structure with antimony mask layer.solid state commun.,134(6),375. |
| MLA | Zhang F,et al."Investigation on the static recording characteristic of super-resolution near-field structure with antimony mask layer".solid state commun. 134.6(2005):375. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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