离子束技术在光学薄膜中的应用
文献类型：学位论文
| 作者 | 王聪娟 |
| 学位类别 | 博士 |
| 答辩日期 | 2008 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 邵建达 |
| 关键词 | 光学薄膜 离子束清洗 离子束辅助 离子束辅助反应沉积 离子束后处理 |
| 其他题名 | Application of ion beam technology in the preparation of optical coatings |
| 中文摘要 | 离子束技术是目前薄膜制备中广泛应用的一类技术，根据施加在薄膜制备的前、中、后三个阶段分别称为离子束清洗、离子束辅助沉积和离子束后处理技术。本文通过对各个阶段离子束技术对光学薄膜性能的影响进行分析，提出了制备高性能薄膜的合适的使用条件，对于实际生产和应用具有一定的指导意义。主要研究内容如下： 1. 研究离子源运行原理和优缺点，分析了离子源参数的影响，对离子源的束流密度和能量等参数进行了测量，通过调节离子源位置获得均匀分布的离子束流，并设计了一套离子源束流密度和能量的同步测量装置。 2. 分析不同参数离子束清洗技术对基片表面形貌的影响，并镀制了单层氧化铪和氧化硅薄膜，获得了合适的离子束清洗条件。 3. 调节离子源参数对单层氧化铪薄膜和1053nm增透膜分别进行了离子束辅助，研究了离子束辅助技术对膜层性能的改进作用，并讨论了这一技术的优缺点。 4. 研究了离子束辅助反应沉积技术对薄膜缺陷密度和均匀性的改善情况，通过参数的选择获得尽可能高的损伤阈值，但由于化学计量比失衡导致吸收和损伤阈值均未能达到以氧化铪为初始材料电子束蒸发所达到的水平。 5. 对单层氧化铪薄膜和1053nm增透膜分别采用不同能量离子束进行后处理，研究了离子束轰击对薄膜性能的改善作用；比较离子后处理与退火和激光预处理对氧化铪薄膜性能的改善作用，分析三种方法各自的作用机理和适用范围。 |
| 英文摘要 | Ion beam technology is widely used in the preparation of optical coatings. Its application includs ion beam cleaing, ion beam assised deposition, and ion beam post-treatment related to different phases of thin film deposition. In this thesis, all of these applications were studied, and suitable conditions were obtained to get high quality coatings for the practical application. Following is the main content : 1. The working mechanism and characteristics of different kinds of ion sources were studied, and the effect of the ion source parameters was analyzed. The spatial distribution of ion beam current density and ion energy were measured, and a uniform distributed ion beam was got at a certain angle. An in line testing equipment of ion beam current density and ion energy was designed to get the information of the ion energy. 2. The influences of ion beam cleaning on the characteristics of the substrate at different parameters such as the surface cleanness, surface roughness and surface topography were investigated. Hafnia single layers were also prepared at different conditions. 3. Ion beam assisted deposition technology at different parameters on hafnia single layer and 1053nm antireflective coatings were investigated respectively. It was found that ion beam assisted deposition at certain parameter could help to increase the quality of the coatings. 4. HfO2 single layer prepared by reactive ion beam assisted deposition had been studied. It was proved to be helpful for decreasing defects density and optical uniformity, but the laser induced damage threthold didn't reach the level of e-gun beam evaption affected by the substoichiometry defects. Ion beam post-treatment had been operated respectively on hafnia single layer and 1053nm antireflective coatings. The effect of ion bombardment on the performance of the coatings had been studied. Heat treatment, laser conditioning and ion post-treatment had also been compared by the improvement of the HfO2 single layers, and the mechanism and suitable extent was studied. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/15212]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 王聪娟. 离子束技术在光学薄膜中的应用[D]. 中国科学院上海光学精密机械研究所. 2008. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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