离子束技术在高功率激光薄膜中的应用
文献类型：学位论文
| 作者 | 张大伟 |
| 学位类别 | 博士 |
| 答辩日期 | 2005 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 邵建达 |
| 关键词 | 离子束 激光薄膜 离子源 离子束流密度 离子束辅助 损伤阈值 |
| 其他题名 | The application of ion beam technology to the preparation of high power laser films |
| 中文摘要 | 本文围绕离子束技术在高功率激光薄膜制备中的应用，以"认识离子束技术、研究和使用离子束技术"为线索展开。本文首先介绍了不同类型离子源的工作原理和优缺点，介绍了Maro一n离子源安装中需注意的问题。建立了镀膜时真空室压强对薄膜堆积密度影响的模型，并根据该模型，强调了离子束镀膜机真空抽速的重要性。为了研究离子束特性，设计了使用方便、可实现多点探测的离子束流密度的测量装置。总结了离子束对薄膜的微观作用机理以及宏观作用过程。研究了离子束清洗技术对基片表面清洁度、表面能、粗糙度、表面形貌等属性的影响，建立了离子束清洗基片的清洗模型，并运用该技术成功地使单层氧化铅薄膜的损伤阂值从9．6J／cm2提高到18J／cm2。研究了离子束流密度对氧化铅薄膜光学属性的影响，发现离子束辅助沉积技术有助于得到光学均匀的氧化错薄膜。进行了离子束辅助沉积氧化铅单层膜和增透膜属性的研究，强调了影响薄膜抗激光损伤特性的不利因素和有利因素互相竞争的观点。进行了金属物制备氧化铅薄膜的研究，发现离子源的工作参数可显著影响薄膜的抗激光损伤特性，指出不同方式制备高功率激光薄膜所需要控制的缺陷种类不同，离子束反应辅助沉积方式主要应抑制薄膜的金属性，提高薄膜的化学计量比。 |
| 英文摘要 | The application of ion beam technology to the preparation of high power laser films was discussed. And the main topics were seeing, studying and applying of ion beam technology. Firstly, the merits and faults of different kinds of ion sources were introduced, and the problems of the installation of Mark- II ion source were recommended. Then the model to formulate the influence of the pressure during the deposition in the vacuum room on the packing density of the films was established. According to the model, the importance of the vacuum pump speed was indicated during the application of ion beam technology. To investigate the characteristics of the ion beam, the instrument with the merits of convenience and multi-metering to measure the ion current density was designed. The microscopic mechanism and the macroscopic process of the action of ion beam on the films were generalized. Then the influences of ion beam cleaning technology on the characteristics of the substrate such as the surface cleanness, surface energy, surface roughness and surface topography were investigated. The model of ion beam cleaning was established. Using this kind of technology, the laser induced damage thresholds of HfOi single layer film was increased from 9.6 J/cm2 to 18 J/cm2. The influences of ion beam current density on the optical properties of ZrOi films were investigated and it was found that ion beam assisted deposition could help to get ZrC>2 films with high optical homogeneity. The characteristics of HfCh and AR films prepared by ion beam assisted were also analyzed, and the viewpoint that the disadvantages and advantages of influencing the film's ability of anti-laser damage compete against each other was put forward. Finally, the HfC>2 films were prepared with ion reactive assisted deposition. It was found that the parameters of ion source had significant influenced on the films character of anti-laser damage. The paper also pointed out that the defect types during the high power laser films preparation by different deposited techniques were also different. The main problems for ion reactive assisted deposition are metallic characteristic and non-stoichiometry needs to be controlled. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/15499]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 张大伟. 离子束技术在高功率激光薄膜中的应用[D]. 中国科学院上海光学精密机械研究所. 2005. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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