薄膜生长机理及双折射特性研究
文献类型：学位论文
| 作者 | 齐红基 |
| 学位类别 | 博士 |
| 答辩日期 | 2005 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 邵建达 |
| 关键词 | 薄膜生长 计算机模拟 双折射 消偏振 |
| 其他题名 | The Study of Growth Mechanism and Birefringent Behavior of Thin Film |
| 中文摘要 | 随着集成电路、固体发光及激光器等领域的迅速发展，薄膜科学技术愈来愈受到重视。一方面，人们不断探索新的薄膜制备工艺制备满足特殊要求的薄膜；另一方面，深入研究不同工艺条件下薄膜生长机理，对薄膜生长进行控制。对薄膜生长机理研究常常集中在对其初始生长阶段成核及岛生长、合并、渗析过程的研究。在薄膜初始生长阶段，已经形成的成核理论包括毛细管理论（Capillaritytheory）、原子成核理论（StatisticalorAtomistictheo理）等，对于这一阶段的模拟常采用基于原子模型和随机过程的MonteCarfo方法。由于薄膜界面演化取决于薄膜生长中的热力学及动力学过程，对于薄膜表面演化过程的研究可以了解薄膜生长中复杂动力学过程。因此，对薄膜表面形貌及其演化过程的研究也是探索薄膜生长机理的主要途径之一，在这一阶段对薄膜生长的模拟通常采用数值微分方法。本论文对于各向同性及各向异性薄膜的生长机理进行了初步研究。在此基础上，研究了电磁波在双折射薄膜界面的传播特性，并利用薄膜双折射特性设计了一系列消偏振薄膜器件。对于各向同性薄膜，在初始生长阶段，我们采用MonteCarfo模拟方法研究了沉积速率、沉积温度、基底晶格结构等因素对薄膜表面团簇生长过程的影响，并目＿计算了表面团簇的尺寸分布；在连续成膜阶段，我们采用数值微分布方法模拟了不同表面扩散系数及表面张力系数下薄膜表面演化过程，并与不同工艺下制备的认、针J薄膜表面形貌特征进行比较，发现薄膜生长过程可以利用Kuromoto-sivosllinsky模型来描述，且沉积参数（如温度、粒子能量）与模型中不同项的系数之间具有密切关系。另外，利用数值微分方法研究了Kuramoto-sivoshinsky模型作用下非光滑基底表面薄膜演化过程。模拟结果表明，拍薄膜生长初始阶段，材料沉积对于初始粗糙荃底表面具有平汾作用，这与粗糙基底表面ZrO2薄膜表面粗糙度的变化规律一致。对于各向异性薄，我们利用MonteCarlo方法模拟了倾刹入射条件下薄膜微结构演化，发现除了阴影效应及表面扩散外，沉积粒子在团簇边缘的吸附效应也是薄膜呈现各向异性生长的原因，另外，薄膜各向异性微结构通常甘致芯膜具有双折射特性，因此，我们计算了双折射薄膜界面电磁波传播特性，重点讨论了异常光波在双折射薄膜界面存在的一些有意义学学现象，如同侧折射现象、宽角度布儒斯特现象，并且利用解析方法给出这些现象存在条件。在此基础上，导出双折射薄膜内异常光传播的2X2特征矩阵。另外，利用薄膜双折射特性对光线倾斜入射时两种偏振态光波的等效导纳进行补偿，设计了一系列消偏振薄膜器件如分束薄膜、截止滤光片及可见光范围内减反薄膜等。在对本论文工作总结基础上，提出一些关于薄膜生长的研究方向。 |
| 英文摘要 | With the rapid development of high-technology industry such as integrated circuit, solid-state luminescence and laser, great progress has been made in science and technology of thin film. On the one hand, the new technology in the preparation, the control and the measurement of thin film comes forth one by one. On the other hand, the study to the growth mechanism of thin film has been made more thoroughly and comprehensively. Many nucleation theories of thin film such as capillarity theory, statistical or atomistic theory, etc., had been developed. At the same time, the computer simulation has played a great role in studying the initial growth, including the nucleation, the growth, the coalescence, and the percolation of cluster. In this stage, the Monte Carlo and molecular dynamic methods are often used to simulate the growth process of thin film. The evolution of interface can provide the information of thermal and dynamic behaviors during the growth process in the statistic point of view, therefore, surface morphology has been probed in an effort to gain a fundamental understanding of growth processes of thin film. In this stage, the numerical differential method can be used to simulate the evolution of interface of thin film based on the growth models. In this dissertation, the emphasis was placed on the isotropic and anisotropic growth of thin film. Then, we studied the electromagnetic propagation in the anisotropic layered medium, and gave a series of non-polarizing designs using the anisotropic thin film. For isotropic thin film, we investigated the influence of the parameters such as the deposition rate, temperature, the type of substrate, etc., on the growth process, and gave the size distribution of clusters in the initial stage. Besides, we used numerical differential method to study the effect of diffusion coefficient, surface tension coefficient on the interface evolution of thin film, which were compared with the interfaces of molybdenum and titanium thin film prepared under the different processing parameter. Besides, we investigated the growth process of thin film on the nonplanar substrate based on the Kuramoto-Sivashinsky growth model. The simulation result shows that the deposition of particles has smoothing effect on the interface of thin film, which is consistent with ZrO2 on the roughness substrates of K9 (Borosilicate glass) glass. For anisotropic thin film, we simulated the evolution process of microstructurc of thin film in the glancing angle deposition technique based on the Monte Carlo method, and found that the overhangs/vacancies had great influence on the microstructure of thin film as well as shadowing effect and surface diffusion. The anisotropic microstructure always leads to the optical anisotropy. Therefore, we gave some theoretical analysis and numerical calculation of the electromagnetic propagation in the anisotropic layered medium. The emphasis was placed on some interesting optical phenomena such as homolateral refraction, wide-angle Brcwster and their occurring condition at the incident and exit interfaces. Basing on numerical calculation of (he propagation directions and the refractive indices of ray and wave vector, we gave the 2*2 characteristic matrix of extraordinary wave in the anisotropic thin film. Furthermore, we designed a series of non-polari/.ing thin Him, such as beam splitter, edge filter, band-pass filter, etc., with the anisotropic materials. In the end, some new research contents are put forward. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/15503]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 齐红基. 薄膜生长机理及双折射特性研究[D]. 中国科学院上海光学精密机械研究所. 2005. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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