深刻蚀石英光栅的设计与制作
文献类型：学位论文
| 作者 | 冯吉军 |
| 学位类别 | 博士 |
| 答辩日期 | 2010 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 周常河 |
| 关键词 | 简化模式理论 深刻蚀光栅 石英分束器 正弦槽型 归一化设计理论 |
| 其他题名 | Design and Fabrication of Deep-Etched Fused-Silica Grating |
| 中文摘要 | 周期性是物质的常见属性，自然界中的周期性介质随处可见。而光栅是最基本的一种周期性结构，在不同的领域中有着广泛的应用。虽然光栅诞生于两个世纪前，但到目前为止，光栅还在继续发展着，吸引着科学家们的持续关注，具有旺盛的生命力。随着微电子刻蚀工艺等加工技术的成熟以及有关光栅设计的数值模拟技术的发展，光子晶体、光栅表面等离子体波等一系列新兴学科方向方兴未艾。本博士论文主要针对近年来兴起的深刻蚀石英光栅这一新方向，介绍了以下几个方面的研究工作： 1) 基于深刻蚀石英光栅的物理机制，发展并提出了深刻蚀光栅的简单设计方法，优化并制作了一系列高效率石英深刻蚀透射式光栅分束器。深刻蚀光栅的物理机制可由简化模式理论来解释，即仅考虑光栅区域内被激发的为数不多的传播模。考虑各级次衍射场与传播模式场之间的能量交换过程，就可以得到光栅各级次衍射效率的解析表达式，可以给出极为简单的公式，指导深刻蚀光栅的设计，从而简化深刻蚀光栅繁杂的设计过程。我们发展了利特罗条件下的矩形光栅的简化模式理论[Optics Communications 281, 5298-5301 (2008)]，并指导设计了高效率偏振无关1×2分束光栅。利用全息曝光技术、微电子刻蚀(感应耦合等离子体刻蚀)等光栅加工工艺，我们成功制作了这一光栅[Applied Optics 48, 5636-5641 (2009)]。另外，根据简化模式理论还可以指导设计出一些新型的偏振选择分束光栅，如我们设计并制作了对TM偏振光能实现1×2分束、对TE偏振光能实现-1级高效率衍射的偏振选择光栅分束器[Applied Optics 48, 2697-2701 (2009)]。此外，我们首次提出了垂直入射情况下的矩形深刻蚀石英光栅的简化模式理论，可以用来清晰的表现光栅区域的物理图像。我们先用严格耦合波分析设计了垂直入射下的偏振无关高效率1×3分束光栅，再由所提出的简化模式理论进行分析，两者结果符合的非常好[Applied Optics 47, 6638-6643 (2008)]。我们还成功制作出了所设计的高效率1×3光栅分束器(理论总透射效率高于97%)，其实测效率优于美国Optometrics公司出产的1×3分束光栅(总效率仅75%)，显示出了深刻蚀石英光栅非常优良的性能，具有重要的实用前景。 2) 拓展了针对正弦槽型深刻蚀光栅的简化模式解释，优化并制作了正弦槽型光栅偏振分束器。根据模式的奇偶性质以及平均有效折射率的概念，可以对一些非矩形槽型深刻蚀光栅的物理机制进行分析。我们对此进行了拓展，并提出了平均有效折射率的严格积分表达式。据此设计出了正弦槽型偏振分束光栅，它比传统的矩形槽型偏振分束光栅具有更高的衍射效率及消光比，性能更为优越。同时，通过全息曝光技术、感应耦合等离子体刻蚀工艺，并结合湿法腐蚀方法，我们首次加工出了具有类似正弦槽型结构的深刻蚀石英光栅，实验结果与理论预期相符，该工作发表于[Applied Optics 49, 1739-1743 (2010)]。从制作加工的角度来说，实际上，大多数情况下所制作的矩形深刻蚀光栅，其光栅槽型的矩形形貌并不能得到严格保证，而正弦槽型却是可以近似模拟的。由于正弦光栅比矩形光栅的衍射效率要高，性能也较矩形光栅要好，因而，正弦槽型深刻蚀光栅代表了更多偏振选择或偏振无关高效率器件发展的一个新方向。可以预期，在不久的将来，会有更多各种各样的正弦槽型深刻蚀光栅被加工出来，其应用范围也会更为广泛。 3) 根据光栅的简化模式理论，提出了深刻蚀石英光栅的归一化设计方法。目前采用的数值矢量计算方法，常见的如严格耦合波分析、经典模式理论等，可以精确的分析深刻蚀光栅的衍射特性，但这些方法物理过程复杂，计算效率不高，不易理解和掌握。尤其在设计一些非矩形槽型光栅时，由于需要进行分层考虑，计算量几十、几百倍的增加，需要耗费大量的计算时间，势必会影响深刻蚀光栅的研究、设计和应用。利用光栅的简化模式理论，能够清晰地得到光栅的归一化结构参数，即所得到的某一功能光栅的结构参数，是波长无关的，仅与波长与周期的比值以及槽深与周期的比值有关[Applied Optics 48, 5636-5641 (2009)]。如果能够得到光栅某一功能的一组设计参数，在不同的波长下都能够适用，无疑将大大降低光栅设计的计算量，对工程技术人员具有重要的实际指导意义。 本博士论文，包括了深刻蚀石英光栅的物理机制、设计方法、制作工艺等方面的主要研究结果。这些工作将加深人们对深刻蚀光栅这一新兴学科方向的认识，有益于深刻蚀光栅的实际应用与产业化。对深刻蚀光栅的进一步研究以及应用，还会继续深化。 |
| 英文摘要 | Periodic media can be found almost everywhere in nature. One of the most basic periodic structures is the grating, which has been widely used for various applications. Though the grating was invented two centuries ago, it is still developing. Novel gratings are still attractive for practical applications. With the growing of the microelectronics etching technology and the developing of the numerical simulation technique on the grating design, some new directions such as photonic crystal, surface plasmonics, etc., are in the ascendant. My research works on the burgeoning subject of deep-etched fused-silica grating are included in this doctoral dissertation. 1) Based on the physical mechanism of modal method, a simple design method of deep-etched fused-silica grating is proposed and developed, and a series of high-efficient deep-etched fused-silica transmission beam splitter gratings are investigated and fabricated. The simplified modal method can be used to explain the physical mechanism of deep-etched grating, and only few excited propagating modes in the grating area need to be considered. By analyzing the energy exchange between the diffractive waves and the propagating grating modes, analytical expressions of diffraction efficiencies can be obtained. This can be used to guide the grating design and simplify the complicated numerical process. The simplified modal method is developed [Optics Communications 281, 5298-5301 (2008)], which is used to guide the design of a highly efficient polarization-independent 1×2 beam splitter grating that is manufactured by holographic recording and inductively coupled plasma (ICP) etching technology [Applied Optics 48, 5636-5641 (2009)]. Furthermore, several novel polarization-selective beam splitter gratings can be designed based on the simplified modal method. For example, we design and fabricate a polarization-selective beam splitter grating, which can be used as a two-port beam splitter for TM polarization and as a grating with high efficiency of -1st diffraction order for TE polarization [Applied Optics 48, 2697-2701 (2009)]. Moreover, we propose a simplified modal method for a deep-etched fused-silica grating under normal incidence for the first time, which could reveal the physical image of the deep-etched grating clearly. We designed a polarization-independent 1×3 beam splitter, and the results are in coincidence with the proposed simplified modal method [Applied Optics 47, 6638-6643 (2008)]. The designed 1×3 beam splitter grating is manufactured successfully (with total theoretical efficiency of 97%), whose performance is better than commercial product, e.g., the total efficiency of a 1×3 beam splitter grating produced by a US company, Optometric, is only 75%. This indicates the wide applications of the deep-etched gratings. 2) Simplified modal explanation of deep-etched sinusoidal-groove fused-silica grating is expanded. A sinusoidal-groove polarizing beam splitter grating is designed and manufactured. Based on the odd and even property of grating modes and the average effective mode index, the physical mechanism of a deep-etched grating with non-rectangular groove can be analyzed simply. We propose a rigorous integral expression of the average effective mode index, which is helpful for the design of a sinusoidal grating. The designed sinusoidal polarizing beam splitter can perform better than the rectangular one, and the sinusoidal one has higher diffraction efficiency and better extinction ratio. By applying wet etching technology on the rectangular grating, which was manufactured by holographic recording and inductively coupled plasma etching technology, the sinusoidal grating can be approximately fabricated, with experimental results coinciding with theoretical values. This work is published on [Applied Optics 49, 1739-1743 (2010)]. With respect to grating fabrication, a rectangular groove shape is not easily guaranteed, while a sinusoidal one can be approximated. And the sinusoidal grating can perform better than traditional rectangular ones for higher efficiency. So this sinusoidal grating indicates a new direction for the design and fabrication of more polarization-selective or polarization-independent highly efficient gratings. Fabrication of various deep-etched sinusoidal gratings for wide practical applications can be expected in the near future. 3) A unified design method of deep-etched fused-silica grating is proposed based on the simplified modal method. At present, the numerical method, such as rigorous coupled-wave analysis, classical modal method, etc., can calculate the diffraction characteristic exactly, but it cannot be easily understood for the complicated physical process, and the computational efficiency is not high. Particularly for the design of the grating with non-rectangular groove, the computation can be increased hundreds times because of the decomposition into multiple layes. And this would take long calculation time, and it would decrease the efficiency of the study, design, and application of deep-etched gratings. However, the unified grating parameters can be obtained by the simplified modal method, that is, the obtained grating structure depends little on the incident wavelength, but mainly on the ratio of incident wavelength to grating period and the ratio of groove depth to grating period [Applied Optics 48, 5636-5641 (2009)]. Since the grating structure parameter is effective for different incident wavelength, the unified grating design would reduce the calculation time for other wavelengths, which would be particular helpful for practical engineers. This dissertation includes the physical mechanism, design method, and fabrication process of deep-etched fused-silica grating. It would enhance the knowledge on this burgeoning subject of deep-etched gratings, which should be helpful for practical applications and industrial implementation. Further study and application expansion would keep going in the future. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/15618]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 冯吉军. 深刻蚀石英光栅的设计与制作[D]. 中国科学院上海光学精密机械研究所. 2010. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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