高性能COIL系统激光薄膜的研究和制备
文献类型：学位论文
| 作者 | 王英剑 |
| 学位类别 | 博士 |
| 答辩日期 | 2003 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 范正修 |
| 关键词 | COIL 超低损耗高反射薄膜 窗口增透膜 高反射相位薄膜 离子束溅射 表面热透镜 光腔衰减法 吸收 散射 损伤阈值 |
| 其他题名 | The investigation and fabrication of the high performance optical thin films in COIL |
| 中文摘要 | 本文围绕COIL系统光学薄膜的特点，主要做了三个方面的工作:超低损耗高反射薄膜性能的研究;窗口及其增透膜性能的研究;高反射相位薄膜的初步研究。 对于超低损耗高反射薄膜，从影响薄膜反射率的因素入手，着重分析了引起薄膜散射和吸收的原因，如基底的表面粗糙度、薄膜材料的匹配、沉积工艺等，并运用驻波场理论进行膜系设计。在对比电子束热蒸发和离子束溅射沉积工艺后，发现:散射损耗是限制薄膜反射率提高的主要原因，但吸收损耗是判断薄膜性能的一个重要参数;离子束溅射技术在降低散射损耗、提高薄膜稳定性等方面具有独特优势。采用离子束溅射技术、Ta205/Si02薄膜材料组合、精抛光的硅基底(均方根粗糙度O.5nm)，在国内首次实现了反射率为99.99%的超低损耗高反射薄膜。同时，还用相关的测试技术分析薄膜的性能:利用表面热透镜技术对1315nm高反射薄膜弱吸收进行测量，首次测量到小于20ppm的吸收;利用光腔衰减法测量到了薄膜的反射率为99.99%. 热处理对高反射薄膜性能的影响是另一个研究重点。文章分析了热处理对薄膜的表面粗糙度、薄膜的微结构、薄膜的稳定性以及损伤阂值等的影响。发现了一些独特的现象:随着热处理温度的提高(4000C以内)，Ta205/SiO2高反射薄膜的中心波长向长波移动;薄膜的表面粗糙度减小;薄膜的损伤闭值提高，而且在热处理前后薄膜均保持非晶结构。 |
| 英文摘要 | In this paper, the main topic includes the following aspects: the ultra-low loss mirror; the AR thin film and windows; and the retarder. For the ultra-low loss mirror, several factors confining to the improvement of reflectivity, such as, the roughness of the substrates, the matching of coating materials, the deposition techniques, are analyzed, then the design principle of ultra-low loss mirror is given according to standing wave electric field (SWEF). By comparing the e-beam gun (EB) with the ion-beam sputtering (IBS), it is found that the scattering loss is the main factor confining to the reflectivity, but the absorption is the important parameter of the optical thin films in COIL; the IBS is dominating in reducing the surface roughness, improving the stability of thin films. So, the IBS is chosen to fabricate the ultra-low loss mirror, with the match of Ta205/Si02 on super polishing silicon substrate, the reflectivity of 99.99% at the wavelength of 1315nm has been first got in domestic. Meanwhile, the related measurements are applied to the optical thin films: The surface thermal lensing (STL) technique is used to measure the weak absorption of the thin films, and the absorption of 20ppm has been measured; the reflectivity of 99.99% has been measured by Ring Cavity Down technique (RCD). The effect of the annealing on the properties of the HR thin films is another focus. It is found that with rising of the temperature (within 4000C), the avelength of the HR (Ta205/Si02) is shifted to longer, the surface roughness is smoother, and the damage threshold is higher. Moreover, the micro-structure of the HR is non-crystal. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/15806]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 王英剑. 高性能COIL系统激光薄膜的研究和制备[D]. 中国科学院上海光学精密机械研究所. 2003. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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