基于达曼光栅的并行激光直写光刻机研究
文献类型：学位论文
| 作者 | 朱锋 |
| 学位类别 | 博士 |
| 答辩日期 | 2014 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 周常河 |
| 关键词 | 激光并行直写 自动聚焦 达曼光栅 微纳加工 误差分析与校正 |
| 其他题名 | Parallel Direct-Laser-Writing Lithography Based on Dammann Grating |
| 中文摘要 | 激光直写技术是微纳结构加工的一种核心技术，具有无需掩模、对环境要求小、加工效率高等优点而得到了广泛的应用。自20世纪80年代以来，半导体集成电路微型化遵循着摩尔定律迅猛发展，带动了微纳加工技术进入了纳米时代，微纳加工技术已成为推动半导体制造业发展的重要技术手段。 传统的激光直写技术由于同时只有一个刻写光束进行刻写，因此加工效率相对比较低下，尤其在加工大尺寸、高密度的衍射光学元件(例如大面积脉冲压缩光栅)时，更是由于加工时间过长而基本无法应用。因此为了解决刻写效率低下的缺点，必须提高传统激光直写技术的并行度，而本文在总结了基于波带片阵列、数字微镜阵列、微透镜阵列、扫描光束干涉光刻等并行光刻技术优缺点的基础上，提出了基于衍射光学元件达曼光栅(Dammann Grating)分束并行直写技术，基于该技术方案搭建了实验样机平台并持续的对其进行升级改进。 本博士论文围绕着提高该并行直写系统刻写性能这一目标进行展开，主要进行了以下几个方面的研究工作： 1.分析了基于达曼光栅并行直写系统系统的设计目标定位，给出了系统的整体设计原理图以及每个子模块的设计过程和关键技术原理，根据系统设计定位需要选择合适类型的元器件以及具体的参数指标。重点介绍了系统的三个主要的子模块：自动聚焦模块、直写光刻模块、样品扫描模块的设计过程和原理；详细分析了自动聚焦模块中的像散法聚焦原理、设计建模过程及结果，提出系统核心分束原件达曼光栅的分束直写概念以及具体应用到系统中的实际问题。 2.重点讨论了基于达曼光栅的并行激光直写系统中存在的若干关键技术问题。主要包括核心分束元件达曼光栅的均匀分束原理，详细推导出了标量情况下达曼光栅的理论设计过程，给出了本实验室制作的达曼光栅衍射分束点阵图，测试了其在405 nm波长下能量均匀性。达曼光栅应用方面，提出了旋转达曼光栅分束并行刻写技术以及基于双光子吸收结合达曼光栅分束并行直写技术。接下来分析了环境振动的影响与消除方式、移动平台组合方式以及误差测试与补偿、刻写光束焦点Z向误差分析与校准、刻写光源能量稳定性测试与功率标定等内容。最后，对整个并行刻写系统的硬件以及软件控制结构进行了详细的阐述。 3.实验方面，介绍了本实验室采用的激光直写法制作衍射光学元件的工艺流程，详细分析制作工艺流程中的ICP干法刻蚀技术的关键问题。对基于达曼光栅并行直写系统的前期验证平台以及采用双分离式样品扫描结构的集成化刻写设备的建模与实物图进行展示与分析，同时对并行刻写系统极限刻写性能进行测试，包括最小结构特征尺寸的刻写测试、不同周期大小和占空比的铬光栅模板制作、大面积模板快速刻写测试以及刻写扫描场的拼接测试。为了进一步验证该并行系统具有刻写达到应用标准的衍射元件的能力，利用简化模式分析方法优化设计了TE偏振下532.8 nm高效率1×3光栅分束器，并且通过本并行刻写系统进行制作，对该光栅分束器进行光谱效率测试，实验结果进一步证实了基于达曼光栅并行直写系统的刻写性能。 本文讨论了基于达曼光栅分束并行直写技术并用于制造微纳光学元件的基本原理，建立了完整的理论模型，重点设计了基于象散法的自动聚焦装置，搭建了多组实验性的直写平台，设计并且制作了核心分束元件达曼光栅，分析并校正了刻写系统中的各种误差。同时为了验证直写性能，刻写出了大量高质量的光栅掩模板以及位相型光栅结构元件。 |
| 英文摘要 | The Direct Laser Writing (DLW) technique is one of the core technologies of manufacturing micro/nanostructures, which is well established and widely used with the advantages of no need of masks, low requirements of environment and high efficiency. The miniaturization of semiconductor integrated circuit develops rapidly following the Moore law since 1980s, which drives the micro/nanofabrication technologies into the nanometer era. The micro/nanofabrication technique has become the key technical means to the developments of semiconductor manufacturing industry. Traditional direct laser writing technique has a fairly low fabrication efficiency because of the only-one writing laser beam at a same time. The long processing time makes it inappropriate to be used to make large-area high-density diffractive optical elements(DOEs, such as large-area pulse compression gratings).To overcome the disadvantages of low manufacturing efficiency, the parallelism of traditional direct laser writing should be significantly improved. A paralleling direct laser writing technique based on Dammann grating beam-splitting was proposed, on the basis of summarizing the strengths and weaknesses of previous paralleling methods, such as Zone-plate-array lithography(ZPAL), DMD lithography, microlens array(MLA) and scanning beam interference lithography(SBIL). The experimental system was built up based on the scanning Dammann lithography(SDL) scheme and the continuously improvements to the system was carried on. This doctoral dissertation, with the purpose of improving the performance of the parallel scanning writing system, mainly works on the following aspects: 1.Design target localization analysis of the parallel laser writing lithography system based on the Dammann grating, the holistic schematic diagram of the system, design processes and key techniques of each sub-module, choosing standards of the appropriate elements and performance parameters according to the design are given successively. Three main modules of the writing system, which is auto-focus module, writing optical path module and sample scanning module, together with their design processes and principles are described detailedly. Principle of the astigmatic method for focusing, together with the modeling design procedures and results are discussed adequately. Also the concept of laser paralleling direct writing based on the key beam-splitting element(Dammann grating) was proposed and the practical problems of matching up with other devices were also involved. 2.Several key technical problems of parallel laser writing system based on scanning Dammann grating were discussed emphatically. It mainly includes the uniform splitting principles of the Dammann gratings'' sub-beams, derivation of the theoretical design of Dammann grating under the condition of scalar diffraction theory, the diffraction spots array diagrams of the Dammann gratings which were produced by our writing devices and test results of the power uniformity at the wavelength of 405 nm. In the practical application aspects of Dammann grating, we proposed the parallel direct writing technique with rotating Dammann grating splitting and the Dammann grating splitting together with two-photon absorption paralleling direct laser writing technique. Then the influence to the writing system and elimination method of the environmental vibration, combination ways of translation stages, error measurement and pre-compensation of the stages, error analysis and calibration of writing beam foci at the direction of Z-axis, tests of writing laser power stability and matching relationships between writing powers and structure linewths were analyzed in details. Lastly, the controlling structures of the hardwares and softwares of the system have been presented detailedly. 3.In the experimental aspect, fabrication process of the diffractive optical elements by the direct laser writing system were introduced. Key problems of the ICP dry etching technique in the fabrication process of the DOEs were analysed adequately. It displays and analyzes the modeling/physical map of the prophase verifying platform of direct laser writing system based on Dammann grating, which includes the integrated lithography equipment with the separating style scanning structure of the sample translation stages. Meanwhile tests of the ultimate lithography performances of the parallel system, which includes the minimum feature size, fabrication of chromium grating templates with different periods and duty circles, large-area grating masks fast fabrication and the stitching tests of the writing scanning fields, were carried out sufficiently. To further verify the parallel system with the abilities of fabricating diffractive optical elements at the level of practical application standards, a high efficiency 1×3 grating splitter, which is at the wavelength of 532.8 nm under TE polarization, is optimally designed by the simplified mode method. This high-efficiency three-port beam splitter were made by the paralleling DLW system. Test of the spectrum efficiency of the three-port grating splitter were carried out and the results further demonstrate the writing performances of the parallel direct laser writing system based on scanning Dammann grating. This dissertation have discussed the basic principle of the paralleling direct laser writing technique based on the splitting Dammann grating and be used to fabricate the micro-nano optical elements, set up the complete theoretical models, designed the auto-focus device with the principle of astigmatic method, built up several experimental lithography platforms, designed and fabricated the key splitting element Dammann grating, analyzed and corrected many kinds of errors of the paralleling lithography system. In the meantime, plenty of high quality grating masks and phase gratings were produced to verify the properties of the scanning Dammann lithography system. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/15868]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 朱锋. 基于达曼光栅的并行激光直写光刻机研究[D]. 中国科学院上海光学精密机械研究所. 2014. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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