光学薄膜应力实时测量系统研究
文献类型：学位论文
| 作者 | 朱冠超 |
| 学位类别 | 硕士 |
| 答辩日期 | 2009 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 易葵 |
| 关键词 | 光学薄膜 应力实时测量 光束偏转法 线阵CCD 重心算法 |
| 其他题名 | Research on in-situ measurement in optical thin films of stress |
| 中文摘要 | 所有薄膜几乎都处在某种应力之中，它的存在会导致薄膜龟裂、卷曲和脱落，从而限制了薄膜结构的稳定性和功能。薄膜应力的主要部分是薄膜生长过程中建立起来的，即内应力表征的部分。为了了解薄膜生长过程中应力变化的情况，也为了对应力机理做更深入的研究，在薄膜镀制过程实时测量应力是非常必要的。本论文基于这个目的，搭建了光学薄膜应力实时测量系统。 本文利用光束偏转法的原理，设计了双光束实时测量光学薄膜应力系统。完成了装置系统硬件搭建工作，并编写了装置的软件系统。一方面通过串口通信实时记录晶控仪中薄膜厚度和速率的信息，另一方面使用重心算法提取线阵CCD中两光斑位移变化的实时数据，从而得到光学薄膜镀制过程中应力变化的情况。经过多次测量验证了重心算法的有效性，使装置的测量精度达到2.2％。同时分析了双光束实时测量光学薄膜应力系统抗干扰能力强、测量范围大优点。 利用本测量装置分别跟踪测量了常用光学薄膜材料ZnS薄膜，SiO2薄膜，HfO2薄膜的实时应力，得到了三种薄膜在一定实验条件下的实时应力曲线。其中ZnS薄膜，SiO2薄膜全程表现为压应力，HfO2薄膜表现为张应力，各材料都是在沉积的初始阶段出现应力迅速增大的情况，随着薄膜厚度的增加，应力逐渐趋于一个稳定的值。使用本装置系统测量不同应力类型的材料得到了可信的实验结果，充分证实了本装置的实用性，为研究光学薄膜镀制过程中应力变化情况提供了有效可行的测量手段。 本装置系统光路简单，主要部分都在镀膜机真空室外面，易于搭建和维护，可以与任何一台镀膜机兼容，使用广泛。使用本检测系统跟踪测量了在实验室条件下几种常见光学薄膜应力实时变化情况，得到了以前离线测量方法所无法得到的薄膜应力信息，具有一定的创新性，对于深入研究应力机理具有非常重要的价值。 |
| 英文摘要 | All kinds of thin films have the stress problem. The stress can limit the reliability and the function of thin film-based structures due to peeling, cracking and curling. Usually, the main part of stress is built in during the film growth, and this is denoted as intrinsic stress. In order to know the intrinsic stress and to gain insight into the mechanisms of stress build-up, real time measurements are necessary. So an instrument for in-situ measurement in optical thin films during growth was presented. The instrument based on light beam deflection for in-situ stress measurement in optical thin films by using two light beams was designed. The instrument worked well under good condition of hardware and software. On the one hand, the thickness and rate of thin films during growth were noted by serial interface; on the other hand, the variation of the distance between the two beams was noted from the linear CCD through centroid algorithm. Finally, the stress build-up during growth was presented. It was proved that the precision of the instrument is 2.2% after several times of measurement. At the same time, the advantage of the instrument about stable capability and wide measurement range were presented. The stress curves of ZnS, SiO2, and HfO2 during growth were drawn. The ZnS and SiO2 behaved compressive stress and the HfO2 films behaved tensile stress. All materials’ stress increased sharply at the beginning. Then the stress increased slowly and remained constant finally. The practicability of the instrument was proved by the credible experiment results of different films. It supplied an effective method to measure the intrinsic stress. For most components of the instruments were put out of the vacuum chamber, the instrument was easy to build and do maintenance. It can be widely used in every coating machine. The information of instantaneous stress about several materials which can not be measured by the old method, were recorded. As a result, it was innovative and valuable for doing research on the mechanisms of stress. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16411]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 朱冠超. 光学薄膜应力实时测量系统研究[D]. 中国科学院上海光学精密机械研究所. 2009. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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