飞行光学聚焦特性自适应控制及光刻机工件台掩模台技术方案
文献类型：学位论文
| 作者 | 高海军 |
| 学位类别 | 硕士 |
| 答辩日期 | 2003 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 程兆谷 |
| 关键词 | 飞行光学 聚焦特性 变形镜 工件台 掩模台 |
| 其他题名 | Adaptive Controlling of the Focusing Characteristics in Flying Optics & Technical Plan for Wafer Stage and Reticle Stage of Lithography System |
| 中文摘要 | 飞行光学聚焦特性自适应控制主要是从事中国科学院仪器研制项目“激光光束质量控制仪”的研制，从理论和实验上解决飞行光学聚焦特性的控制问题。本论文第2-5章为飞行光学聚焦特性自适应控制。论文在理论上对飞行光学聚焦特性（包括实际焦距、焦斑大小、焦深变化等）进行了深入地研究，尤其是对高功率CO_2激光器中输出藕合窗口由于热变形引起的聚焦特性的改变进行了着重研究，并提出了新的补偿措施。论文对自行研制的自适应液压反射镜的变形规律从理论和实验上进行了研究，得出一些实用性的结论。根据所研制的光束质量控制仪的特点，提出了独特的液压系统设计方案，采用了最新的基于PC的PLC控制思想，并编写了相应的控制程序和接口软件，经过联机调试，取得了良好的效果。光刻机工件台掩模台分系统技术方案是为国家863计划重大项目“100nm步进扫描投影光刻机”而设计的。本论文第6-9章为光刻机工件台掩模台分系统技术方案。该技术方案是在较全面、深入调研国外高水平光刻机技术的基础上，结合我国实际国情而制定。方案主要对工件台和掩模台分系统的机械结构子系统和测量子系统的组成、功能、结构、材料、尺寸、关键元器件、加工工艺和部分误差分析以及环境控制措施等进行详细的阐述。该技术方案得到了众多光刻机专家的好评. |
| 英文摘要 | Adaptive controlling of the focusing characteristics in flying optics mainly comes from the project on "An apparatus for controlling laser beam focusing quality" by Chinese Academy of Sciences, which resolves the problems of controlling focusing characteristics in flying optics theoretically and experimentally. Chap.2-5 of this paper concern the adaptive controlling of the focusing characteristics in flying optics. The focusing characteristics in flying optics (including focal length, focus spot size and focal depth etc.) were deeply researched, practically in the effect of focusing characteristics caused by the dynamic process of resonator deformation in high power CO_2 laser and put forward a new compensating measure. The deformation behavior of the adaptive deformable mirrors, which was actuated by hydraulic source, was also studied in this paper theoretically and experimentally, and some useful results were obtained. An unique hydraulic pressure system design has been put forward based on the characteristics of the quality control apparatus to our study, which adopt the up to date PLC control idea grounded on PC. The corresponding software was programmed and good effect was achieved by online debugging. The technical plan for wafer stage and reticle stage of lithography is one of the "863 Program"-100nm step-and-scan lithography system. Some results about this are presented in chap.6-9. The technical plan was established based on the completely and deeply study of the overseas high-level technology and considering the situation of our country. The plan expatiates the composing, function, structure, material, dimension, component, technics, analysis of some error and the controlling measure of the mechanical configuration and the circumstance of measuring subsystem of the wafer stage and reticle stage of lithography in details. This plan was highly appreciated by several experts in this area. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16449]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 高海军. 飞行光学聚焦特性自适应控制及光刻机工件台掩模台技术方案[D]. 中国科学院上海光学精密机械研究所. 2003. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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