软X射线多层膜沉积技术研究
文献类型：学位论文
| 作者 | 祝国龙 |
| 学位类别 | 硕士 |
| 答辩日期 | 2001 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 邵建达 |
| 关键词 | 软X射线多层膜 磁控溅射 反射率 小角X射线衍射 膜厚监控 |
| 中文摘要 | 软X射线多层膜技术是当今软X射线光学技术的核心。软X射线多层膜反射元件与现代科学技术研究的前沿课题密切相关，它在生物样品的全息术和显微术、惯性约束核聚变和实验室天体物理有关的稠密等离子体偏折测量术、干涉量度学和X射线照相术等方面都非常重要。本论文将着重讨论软X射线多层膜制备时的膜厚监控技术与工艺条件，及其对薄膜性能的影响。在第一章中综述了软X射线多层膜的研究现状。在第二章中介绍了直接决定多层膜质量的两个因素--软X射线多层膜的制备技术和膜厚监控技术。其中，磁控溅射和离子束溅射技术是我们制备软X射一多层膜时采用的两种制备技术；转速控厚法是我们采用的膜厚监控技术。可是，在采用磁控溅射设备制备软X射线多层膜时，因为镀膜机产生的射频干扰了监控设备的工作，所以早期采用的转速控厚法受到了很大的限制。本论文找到了克服射频干扰的方法，最终实现了用计算机控制多层膜的制备过程。我们把这一控制过程称作自动转速控厚法，通过实验证明，这一方法与先前的转速控厚法相比有明显的优点，特别是在制备复杂膜系的多层膜时，自动转速控厚法表现出更为突出的优点。在第三章分析了影响多层膜质量的另一个工艺参数--溅射气压的影响。首先，在三个溅射气压下用磁控溅射的方法制备出Mo/Si样品，然后测试了它们的小角X射线衍射谱，发现溅射气压越高，小角X射线衍射谱的形越差，而且对应样品的反射率也越低。第四章讨论了多层膜的理论设计，并给出了一些利用自动转速控厚法制备的软X射线多层膜的测试结果。例如，我们采用转速控厚法制备的软X射线多层膜-W/Si，在入射角为80°时，在光子能量为700eV和1200eV的波长处都取得了11%的反射率。制备的Co/C多层膜在入射角为75°时对于260eV波长的软X射线具有25%的反射率。实验证明该沉积系统具有良好的性能。 |
| 英文摘要 | Nowadays, the technology of soft x-ray multilayer mirrors is the core technology of soft x-ray optics, and the mirror is useful for a lot of applications, such as microscope, x-ray astronomy, x-ray biologic holography, x-ray lithography, x-ray laser and instrumentation for synchrotron radiation beam lines. What we are mainly concerned about in this paper are the thickness monitoring, technological conditions and the influence of quality of soft x-ray multilayer mirrors led by them. The first chapter illustrates a brief review on the studies of x-ray multilayer mirrors. The second chapter introduces the existing fabrication technology and thickness monitoring technology, which are two decisive factors related to the quality of a x-ray multilayer mirror. The magnetron sputtering deposition and ion beam sputtering deposition are two technologies we used to fabricate soft x-ray mirrors. While fabricating with magnetron sputtering deposition, our former controlling equipment couldn't work because of the radio-frequency interference(RFI) caused by the power supply. Now, a sound solution is found to get rid of the RFI, therefore we can control the fabrication procedure through a programmed computer. The technology has a remarkable advantage for fabricating soft x-ray multilayers with a complicated structure. The third chapter discusses a correlation between small angle x-ray diffraction spectrum, i.e. the quality of a multilayer structure, and the sputtering pressure of Ar. Three Mo/Si multilayers were fabricated on K9 glass using magnetron sputtering at different pressure of Ar. According to their small angle x-ray diffraction spectrums, it is evidenced that the small angle x-ray diffraction spectrum is worse when the multilayer deposited at a high sputtering Ar pressure. In the last chapter, the results of design and characterization of soft x-ray multilayer mirrors are presented. For examples, W/Si multilayers is fabricated, with a 11% measured reflectivity at the incidence angle of 80° for the radiation with a photoenergy of 700 eV and 1200 eV respectively. Co/C is another multilayer mirror we fabricated shows a reflectivity of 25% at the incidence angle of 75° for the radiation with a photoenergy of 260eV. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16569]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 祝国龙. 软X射线多层膜沉积技术研究[D]. 中国科学院上海光学精密机械研究所. 2001. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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