大口径光学薄膜均匀性的研究
文献类型：学位论文
| 作者 | 董磊 |
| 学位类别 | 硕士 |
| 答辩日期 | 2005 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 易葵 |
| 关键词 | 光学薄膜 均匀性 电子束 蒸发源 修正挡板 |
| 其他题名 | Uniformity of Large-size Optical Coatings |
| 中文摘要 | 本文的研究内容主要包括：大口径光学薄膜厚度的分布及其均匀性修正，蒸发源蒸发特性的模拟和实验验证以及薄膜光学不均匀性的修正。在镀制光学薄膜的时候，膜厚均匀性是一个重要问题。膜厚的均匀性不好，将严重影响薄膜的特性。膜厚均匀性是指膜厚随基板表面位置的变化，它和蒸发源与基板之间的配置以及蒸发特性有关。本文对一般常用的平面转动夹具进行了理论分析和实验验证，并根据薄膜厚度的实验分布结果，设计了改善高反膜膜厚均匀性的修正挡板。蒸发源的蒸发特性是光学薄膜均匀性的重要影响因素，本文对蒸发源的蒸发特性和蒸发过程中出现的挖坑效应进行了模拟，并进行了实验验证。由此得到的结论对于实际镀膜有着很强的指导意义。理论上分析了薄膜光学不均匀性的原因，提出用针对不同材料的单独挡板来同时修正薄膜的厚度和光学不均匀性，现已设计出所需的机械机构并进行调试和实验验证。 |
| 英文摘要 | In this paper, the uniformity of large-size optical coatings is discussed in detail, including uniformity of thickness and optical property, and the evaporating vapor distribution of electron beam source. The uniformity of coating thickness has obvious influences on optical properties. As coating thickness changes at different position of a surface, uniformity will be decided by the positions of electron beam source and sample surface and the distribution of evaporating vapor. In this paper, both theoretic analysis and experimental realization are studied for flat fixture. Correction masks are designed and applied according to our results. The uniformity of optical coatings is improved apparently. The evaporating vapor distribution of E-beam source is an important factor that influences the coating uniformity. Plane and spherical evaporation sources are investigated. Based on the analysis, the relation between the source geometrical parameters and coating uniformity is approved by experiments. Finally, the uniformity of optical properties is also studied in the paper, and novel solution of an umbrellalike design is proposed to realize better uniformity. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16618]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 董磊. 大口径光学薄膜均匀性的研究[D]. 中国科学院上海光学精密机械研究所. 2005. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。