13.5nm软X射线多层膜反射镜制备及性能分析
文献类型：学位论文
| 作者 | 朱亚丹 |
| 学位类别 | 硕士 |
| 答辩日期 | 2011 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 易葵 |
| 关键词 | 软x射线膜 厚度均匀性 变速法 磁控溅射 |
| 其他题名 | Fabrication and analysis of 13.5nm soft X-ray reflector |
| 中文摘要 | 13.5nm处的软X射线多层膜反射元件与现代科学技术研究的前沿课题密切相关。它在天文学、极紫外光刻、X射线激光以及同步辐射装置等方面都有非常重要的用途。本文围绕13.5nm处的软X射线多层膜反射镜开展了一系列的研究工作。 分析了影响多层膜反射性能的因素，在磁控溅射镀膜系统上制备了Mo/Si多层膜，通过一系列改进工艺（提高本底真空度，选择超光滑Si基片，选择隔板避免膜层材料的共沉积及调整溅射功率解决辉光放电不稳定现象），最终制备出13.5nm的Mo/Si多层膜在掠入射角55 º获得的s分量的反射率可达到67%。 采用X射线光电子能谱（XPS）对Mo/Si多层膜的表面和界面进行了成分分析，结果表明氧化硅层仅存在于多层膜表面，而多层膜界面并不存在氧污染，说明我们的镀膜系统具有很高的真空度。分析也发现Mo/Si界面之间形成了硅化钼层，材料扩散使界面存在一定宽度，采用四层模型拟合了界面的宽度。 建立了磁控溅射薄膜沉积技术中的单层膜厚度均匀性分析方法，并解释了基底公转速度变速法控制膜厚均匀性的原理。采用磁控溅射制备了均匀性可控的大面积软X射线Mo/Si多层膜。结果表明，通过该方法在直径200mm范围内可将周期结构中Mo的不均匀性从20.6%修正到1.1%，Si的不均匀性从27.0%修正到1.6%。 |
| 英文摘要 | Soft X-ray reflector working at 13.5nm plays an important role in X-ray astronomy, extreme ultraviolet lithography，X-ray laser and synchrotron radiation facility. In this paper, we present a series of research work focused on 13.5nm soft X-ray reflector, including fabrication and characteristic analysis. The influencing factors of Mo/Si multilayer reflection properties prepared by magnetron sputtering are analyzed. A series measures is taken to improve the reflectivity, such as the high base vacuum of deposition chamber, super-polished Si substrates, avoiding codeposition of two layer materials, adjustment of sputtering power to resolve glow discharge instability in long-period. Finally, we fabricate multilayer with s-polarized reflectivity up to 67% at 13.5nm in an grazing incident angle 55°. The surface and interlayer composition of Mo/Si multilayer coatings are analyzed using X-ray photoelectron spectroscopy (XPS). Oxidation silicon was not found at the interlayer but found only at the surface. The results indicate a higher vacuum is a key point to prepare a good X-ray reflector. XPS results also indicate the formation of MoSi2 phase on both the interfaces. Therefore, four layer model is taken to fit reflectivity curve, and interface width is obtained. The method of single layer thickness uniformity analysis and control is established, and variable speed rotation of sample holder to realize the uniformity of large area soft X-ray multilayer is explained. The results reveal that thickness non-uniformity of Mo layer can be controlled in 1.1% and Si layer can be controlled in 1.6% on an area with 200mm in diameter. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16699]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 朱亚丹. 13.5nm软X射线多层膜反射镜制备及性能分析[D]. 中国科学院上海光学精密机械研究所. 2011. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。