光刻机照明均匀化技术的研究
文献类型：学位论文
| 作者 | 肖艳芬 |
| 学位类别 | 硕士 |
| 答辩日期 | 2012 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 杨宝喜 |
| 关键词 | 光刻机 照明系统 微透镜阵列 光束均匀化 均匀性检测 |
| 其他题名 | Research on homogenization technology of lithography illumination system |
| 中文摘要 | 随着微电子产业的迅猛发展，我国迫切需要研制极大规模集成电路的加工设备—高端扫描光刻机。照明系统是光刻机的重要组成部分，其主要作用是提供高均匀性照明、控制曝光剂量和实现离轴照明，以提高光刻分辨率和增大焦深。本论文以光刻机照明均匀化技术为研究方向，研究了光刻机照明系统的发展历程和匀光技术的主要分类，对照明系统中聚光镜和微透镜阵列开展了详细研究，进行了光学设计和照明仿真分析，并针对微透镜阵列的测试研制出了检测装置。 照明系统中一个重要的组成单元是聚光镜，它的主要作用是将不同形状和口径的光束，经过微透镜阵列的整形，会聚到扫描狭缝处，形成所需的均匀矩形光斑。聚光镜的性能对照明光学系统的性能有着重要的影响。文中研究分析了弥散斑和畸变等几何像差对照明均匀性造成的影响，光瞳球差和远心度之间的关系；通过采用非球面可以在较少透镜数量的情况下，有效地减小弥散斑和畸变，提高光能透过率。根据光刻机照明系统对聚光镜的技术要求，经过优化设计，像差分析，照明仿真计算，数据处理，设计出了满足性能要求的F0.95的大相对孔径聚光镜，其弥散斑直径最大0.079mm，远心度最大0.18mrad，不均匀性达到1.15％。 照明系统主要作用之一是能够提供良好的照明均匀性。微透镜阵列作为照明系统中的匀光单元，其实现匀光的原理是将光束分割成许多子光束，子光束再经过它后面的聚光镜会聚成均匀的矩形光斑。微透镜阵列作为光刻机照明系统中的一个重要匀光单元，对光刻机的照明性能起着至关重要的作用。本文经过分析各种匀光单元，以微透镜阵列作为研究对象，采用微凸柱面镜和凹形接缝平滑过渡的结构，利用非球面技术，通过光学优化，设计出微凸柱面阵列的单元结构。经过仿真分析，采用优化后的微凸柱面镜和凹形接缝平滑过渡的结构，有效解决了微透镜阵列单元之间存在平台接缝造成会聚光斑中央形成十字亮线的缺陷，获得了很好的匀光效果，照明不均匀性达到0.85%。 根据光刻机照明系统对微透镜阵列匀光单元的性能要求，研制出了检测装置。文中给出了检测装置的测量原理、主要部件参数的确定、重要元器件的选型依据、测量用聚光镜的光学设计和照明仿真分析、CCD的标定方法、不同照明模式的测试方法等。使用本检测装置可对微透镜阵列的主要性能－不均匀性和能量利用率进行测试。 |
| 英文摘要 | With the fast development of micro-electronics industry in our country, it is necessary to do the research on advanced lithography equipments, for manufacturing integration circuits. Illumination system, serving as one of the main parts in lithography equipment, provides high uniform optical intensity distribution on mask, exposure dose control and off-axis illumination (OAI) modes which enhance the resolution and enlarge depth of focus of lithography. This thesis mainly studied the uniformity of lithography illumination system, the development history of illumination system and the classification of uniformity element. The condenser and micro-lens array are designed and simulated. The micro-lens array testing equipment is developed in order to test the micro-lens array. One of the main parts of illumination system is the condenser. The main function of condenser is to receive the required rectangle beam shape with high uniformity by converging different shapes and apertures of beams emitting from the micro-lens array into the scanning slit. The property of condenser strongly influences the performance of illumination system. This thesis analyzes the uniformity influenced by the diffuse plaques and distortion, the relation between the spherical aberration on pupil and telecentricity. The diffuse plaques and distortion decrease and the transmission increases when uses less pieces of lens. According to the requirement of condenser in the lithography illumination system, the super-aperture condenser of F0.95 is designed. After optimization design, aberration analysis, simulation and data processing, maximal diffuse plaques are 0.079mm, telecentricity is 0.18mrad and non-uniformity is 1.15%. The main function of the illumination system is to provide high uniformities. As the uniformity element in the illumination system, the principle of micro-lens array for providing high uniformity is that micro-lens arrays firstly divide the beam into many sub-beams, and then the sub-beams are converged into a uniformity rectangle beam shape with the help of condenser. As an important uniformity element, the micro-lens array plays a significant role in the illumination system. By analyzing different kinds of uniformity element, the micro-lens array is studied. The micro-convex-cylindrical array is designed with the concave joint using the aspheric technology and optimization design. This kind of structure resolves the plane joint between micro-lens array involving the bright cross line and good uniformity is received as 0.85%. According to the requirement of micro-lens array in lithography illumination system, the testing equipment is developed. This thesis provides the testing principle, the determinant of the main parts’ parameters, the choices of important devices, the design and simulation of the testing condenser, the calibration method of CCD and testing method in different modes. Micro-lens arrays’ uniformity and utilization of energy can be tested with this testing equipment. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16725]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 肖艳芬. 光刻机照明均匀化技术的研究[D]. 中国科学院上海光学精密机械研究所. 2012. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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