光栅成像扫描光刻技术
文献类型：学位论文
| 作者 | 俞斌 |
| 学位类别 | 硕士 |
| 答辩日期 | 2013 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 周常河 |
| 关键词 | 光栅成像 扫描光刻 4F系统 大尺寸 |
| 其他题名 | Grating imaging scanning lithography |
| 中文摘要 | 衍射光栅是一种应用非常广泛且重要的高分辨率的色散光学元件，在现代光学仪器中占有相当重要的地位，它广泛应用于光谱分析、光纤通信、光学测量、空间科学以及激光演示等等各个领域，特别是高密度大尺寸光栅，在国家大工程中有非常重要的用途，例如用于激光核聚变项目上对激光脉冲进行压缩，其衍射效率可以达到95%以上。在光栅制备技术方面，许多国外的科研机构已经制作了密度千线以上的高性能大尺寸光栅，但是，目前国内的光栅拼接、扫描光栅、全息光栅等方面的研究与国外相比存在很大差距，因此针对大尺寸光栅的制造技术的研究与发展已经相当迫切。基于上述现状，我们提出了一种新型的高效的光栅制造技术——光栅成像扫描光刻，该技术具有制作周期短、光栅均匀性好、能量利用率高、尺寸可拓展、光学系统易于操作等优点,具有很大的发展空间。 本文首先回顾了光栅的发展历程、分类和特性，介绍了目前主流的大尺寸光栅制造技术，包括机械刻划，全息光刻和干涉扫描拼接技术，结合这些技术的优缺点，提出了光栅成像扫描光刻技术，详细介绍了该技术的实现过程，针对光栅的尺寸及密度的可拓展性进行了讨论。光栅的尺寸的调整，主要通过选择不同行程的移动台来实现，辅以光栅尺来提高移动台的精度；光栅密度的调节，主要取决于位相光栅的密度以及4F系统透镜的数值孔径。给出了相应的实验结果，周期分别为20µm，10µm，5µm的光栅，讨论了精确定位对最终制备的光栅质量的影响。最后对该技术未来的发展进行了展望，提出了相应的改进措施。 |
| 英文摘要 | Diffraction grating is a high-resolution dispersion optical element. It has been widely used as the key component in optical spectroscopy, fiber communications, optical measurement, space science, and laser systems, etc. Especially the large-sized and high-density grating has a very important use in the National Engineering. For example, the diffraction efficiency can reach 95% or more for the laser pulse compression on laser fusion project. Many foreign scientific research institutions have produced the high-performance large-size grating with the density more than one thousand lines. However, compared with foreign countries, our splicing grating, scanning grating and holographic grating are far less studied. Therefore, the development of technology for fabrication of large-sized grating has become a very urgent task. A new technology of grating imaging scanning lithography was proposed in this dissertation. With the characteristics of short fabrication cycle, a simple structure, high grating uniformity and energy efficiency, grating imaging scanning lithography should be an efficient way to fabricate large-sized grating and there are good prospects for future development. This dissertation reviews the grating history, classification, characteristics and describes the current mainstream large-sized grating fabrication technologies, including mechanically scratching, holographic interference technique and scanning beam interference lithography. Combined with the advantages and disadvantages of these technologies, grating imaging scanning lithography is proposed and the details of the implementation process are described. The scalability for the size and density of the grating is also explained. With the benefit of grating-rule to improve the accuracy, the adjustment of the grating size is realized by selecting a mobile station of different measuring range. The grating density is mainly depending on the density of the phase grating and the numerical aperture of the lens. The finally obtained gratings with the cycle of 20μm, 10μm, 5μm are displayed. At last, close analysis of the aberration shows that precise positioning plays a very important role and some improvement directions are discussed. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16769]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 俞斌. 光栅成像扫描光刻技术[D]. 中国科学院上海光学精密机械研究所. 2013. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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