薄膜宏观应力的微观表征方法研究
文献类型：学位论文
| 作者 | 蔺玲 |
| 学位类别 | 硕士 |
| 答辩日期 | 2013 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 邵淑英 |
| 关键词 | 二氧化铪薄膜，残余应力，弹性常数，微观表征，掠入射X射线衍射 |
| 其他题名 | Research on microscopic characterization of macroscopic stress in thin film |
| 中文摘要 | 几乎所有的薄膜都处在某种应力之中，残余应力的存在会对膜基体系产生有害影响，它会弱化膜基结合力，降低元件使用性能。薄膜的应力状态是由薄膜本身的微观结构决定的，为了得到性能稳定的光学薄膜，有必要明确薄膜宏观应力与薄膜微观结构演变之间的关系，以更深入的了解薄膜应力的产生机制，更加有效地对薄膜应力进行控制。 干涉法和X射线衍射法是两种常用的薄膜残余应力测试方法。干涉法较为简单，仅需通过测量镀膜前后基底的曲率变化，便可计算出薄膜应力。此方法是对薄膜整体形变的直接测量，而这种整体形变实际上会反映在薄膜内部结构发生的微观变化上。X射线衍射法是利用X射线的衍射效应，测量薄膜内部的晶面间距变化，从而得出薄膜的力学状态。 本文以二氧化铪薄膜为研究对象，建立了薄膜晶体结构模型，通过CASTEP软件计算得到了薄膜的弹性常数，并对比分析了用干涉法测量得到的薄膜宏观平面应力和X射线衍射法测得应力之间的关系，给出了宏观应力的微观表征方法。 |
| 英文摘要 | It is generally known that almost all of the films are in the state of stress. The existence of the stress may adversely affect the membrane-based system. It would weaken the film adhesion and reduce the component performance. The stress state in thin film is determined by the microscopic structure of the film itself. In order to get optical thin film with stable mechanical performance, it is necessary to clarify the relationship between macroscopic stress and the microstructure evolution of film. That helps to deeper understand the generation mechanism of film stress and to control it more effectively. Interference and X-ray diffraction (XRD) are two frequently-used methods to measure the residual stress of HfO2 film. The former is relatively simple. The film stress can be calculated just by measuring the curvature of the substrate before and after coating. This method is to directly measure the overall deformation of thin film, and the deformation will be actually reflected on the microscopic changes of inner structure. The latter utilizes the X-ray diffraction effects to measure the interplanar spacing changes for acquiring the film stress state. In this dissertation, crystal structure model of HfO2 thin films were established, and the elastic constants of the films were calculated through CASTEP software. The measured results of these two methods have been analyzed and compared. And the microscopic characterization method of macroscopic stress has been given. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16789]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 蔺玲. 薄膜宏观应力的微观表征方法研究[D]. 中国科学院上海光学精密机械研究所. 2013. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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